Silvaco PDF
Silvaco PDF
Silvaco PDF
11-15-2010 silvaco.ppt
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Process Modeling
OUTLINE
Introduction
Tips (Printing tonyplot)
Getting Started
Printing Deckbuild File
Deckbuild Example
Tonyplot for Example
Summary
References
Homework
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Process Modeling
INTRODUCTION
SUPREM Stanford University PRocess Engineering Module, 1977
ATHENA is Silvaco, Incs. version of SUPREM. ATHENA is
normally used in conjunction with VWF Interactive tools. These
include DECKBUILD, TONYPLOT,DEVEDIT, MASKVIEWS and
OPTIMIZER. DECKBUILD provides an interactive run time
environment. TONYPLOT supplies scientific visualization
capabilities. DEVEDIT is an interactive tool for structure and mesh
specification and refinement, and MASKLVIEWS is an IC Layout
Editor. The OPTIMIZER supports black box optimizations across
multiple simulators. ATHENA is frequently used in conjunction
with ATLAS device simulator. ATHENA predicts the physical
structure that result from processing. These physical structures are
used as input by ATLAS, which then predicts the electrical
characteristics associated with specified bias conditions.
Rochester Institute of Technology
Microelectronic Engineering
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GETTING STARTED
To get started you need to invoke the DECKBUILD application.
DECKBUILD will allow you to specify the process steps you want to
analyze.
(1,0)
(0,0)
X
Open terminal window (shell)
Type deckbuild
commands (RMC) select mesh define
(0,2) Y
commands select mesh initialize (LMC)
commands select process (RMC) deposit (LMC)
select parameters for nitride layer
commands select process (RMC) select implant (LMC)
select parameters for ion implant
tonyplot
quit Rochester Institute of Technology
Microelectronic Engineering
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Process Modeling
DECKBUILD EXAMPLE
go athena
#comment lines start with #
#near location 0m on the x line set grid approximately 0.1 m
#near location 1m on the x line set grid approximately 0.1 m
line x loc=0.00 space=0.1
line x loc=1.00 space=0.1
#near location 0m on the y line set grid approximately 0.01 m
#near location 2m on the y line set grid approximately 0.01 m
line y loc=0.00 space=0.01
line y loc=2.00 space=0.01
#
init silicon phosphorous resistivity=15 orientation=100
#change nitride thickness to investigate implant penetration
deposit nitride thick=0.30
# dual Pearson model is SIMS verified empirical model
implant boron dose=8.0e12 energy=100 tilt=0 \
rotation=0 crystal lat.ratio1=1.0 lat.ratio2=1.0
#
tonyplot
Rochester Institute of Technology
quit
Microelectronic
Engineering
November 15, 2015, Dr. Lynn Fuller, Professor
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3000 Nitride
2500 Nitride
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SUMMARY
Silvaco ATHENA (SUPREM) analysis allows for the calculation of
resultant impurity concentrations, layer thickness, and much more
for processes such as oxidation, diffusion, implantation and
deposition for temperatures above 800 C.
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EXTRACT
The extract command provides a way to output important device
parameters such as oxide thickness, junction depth, sheet
resistance, surface concentration, and threshold voltage. These
results are available in the run dialog window and in the
results.final file. These commands can be placed anywhere in the
input file. A few extract commands are shown below:
extract name="Source Oxide Thickness" thickness material="SiO~2" \
mat.occno=1 x.val=2.0
extract name="Final Source xj" xj material="Silicon" mat.occno=1 x.val=2.0 \
junc.occno=1
extract name="p-type Sheet Rs" p.sheet.res material="Silicon" mat.occno=1 \
x.val=2.0 region.occno=1
extract name="Surface Concentration" surf.conc impurity="Net Doping" \
material="Silicon" mat.occno=1 x.val=10.0
extract name="VTO" 1dvt ntype qss=3e11 workfunc=4.15 x.val=10.0
Rochester Institute of Technology
Microelectronic Engineering
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RESULTS.FINAL FILE
First Oxide=7611.19 angstroms (0.761119 um) X.val=2
2nd Oxide Thickness=8944.31 angstroms (0.894431 um) X.val=10
2nd Oxide Thickness=4251.74 angstroms (0.425174 um) X.val=2
Gate Oxide Thickness=754.154 angstroms (0.0754154 um) X.val=10
Final Source xj=1.84039 um from top of first Silicon layer X.val=2
p-type Sheet Rs=95.5111 ohm/square X.val=2
Surface Concentration=6.86682e+14 atoms/cm3 X.val=10
VTO=-2.08365 V X.val=10
Rochester Institute of Technology
Microelectronic Engineering
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Strip photoresist
Microelectronic Engineering
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Process Modeling
# ramp up from 800 to 1000c soak 50 min dry o2, ramp down to 800 n2
diff time=10 temp=800 t.final=1000 dryo2 press=1.0 hcl.pc=0
diff time=50 temp=1000 dryo2 press=1.0 hcl.pc=0
diff time=20 temp=1000 t.final=800 nitro press=1.0 hcl.pc=0
deposit oxynitride thick=0.01
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BASICS - DESKTOP
A graphical interface that provides workspaces, windows, menus,
controls, and a front panel to help you organize and manage your
software applications.
The Front Panel has a tool bar (usually at the bottom of the
screen).
The tool bar has a K-Gear icon which allows access to editors,
graphics programs and the open office software package. The
open office package has calculators, drawing programs, equation
editor and word processing. You can change the settings for the
look and feel of the desktop and the windows that are running. I
suggest that you do not go too wild changing things , instead stick
to getting the job done.
There are four desk tops available to run programs on. The
toolbar tells you which desktop you are looking at and what is
running in each window on the desktop.
Rochester Institute of Technology
Microelectronic Engineering
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Process Modeling
BASICS CONTINUED
The Mouse: is a three button mouse. The left mouse button is used to
select or click on something. The right mouse button is used for
popup menus. The middle mouse button is typically defined for each
application and does not have a common function. For example in the
layout software IC the middle mouse button shifts the layout so that
the clicked location is centered in the workspace.
Log Out: click on K Gear icon, select Log Out, Select End Current
Session
Restore Session: If there is no activity for several minutes the screen
will be locked and require the user to type his password to restore the
session.
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Description
list the files and directories in the current
list file or folders beginning with name xxx
change directory
move a file (rename a file)
remove a file (delete a file)
print path of current directory
create a new directory
remove a director
displays contents of filename
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REFERENCES
1. Silicon Processing for the VLSI Era, Vol.2., Stanley Wolf
2. The Science and Engineering of Microelectronic Processing,
Stephen Campbell
3. Technology Modeling Associates, TMA-SUPREM-4, Instruction
Manual.
4. Silvaco Modeling, Inc.
5. MicroTec-3.03 release note of March 27, 1998 floppy-disk
contains a complete set of MicroTec-3.03 programs for 2D
semiconductor process and device simulation and the Manual in
Adobe Acrobat format. http://www.siborg.ca
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