Preparation Method EN Magnesium Alloys

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Preparation method

Magnesium alloys
Recommended machines and additional consumables (not included) Pressure parameters and specimen size
CUTTING Equipment Consumables
ATM Brillant Cut-off wheel: diamond, resin bond Specimen
25 30 40 50 60
Anti-corrosion coolant diameter [mm]

MOUNTING Equipment Consumables Divergence in


ATM Opal Hot mounting: Bakelite red/black/green pressure used
-(5 N…10 N) -5 N 0 +5 N +(5 N…10 N)
Cold mounting: KEM 20 in the prepara-
Hot or cold mounting tion methods
GRINDING/ Sample size
POLISHING Ø 40 mm

Notes:

STEP MEDIUM Single


Pressure
rpm N min

SiC-paper/foil  ynchronous
►► S
Planar grinding H2O 250-300 15 Until plane
P320 (280) Rotation

SiC-paper/foil  ynchronous
►► S
Planar grinding H2O 250-300 15 1:00
P800 (280) Rotation

SiC-paper/foil  ynchronous
►► S
Planar grinding H2O 250-300 15 1:00
P1200 (280) Rotation

Diamond suspension (alcohol ►► Synchronous


Polishing BETA 120-150 15 5:00
or oil based Poly, 9 µm Rotation

Diamond suspension (alcohol ►► Synchronous


Polishing SIGMA 120-150 15 5:00
or oil based Poly, 3 µm Rotation

Diamond suspension (alcohol ►► Synchronous


Polishing ZETA 120-150 15 5:00
or oil based Poly, 1 µm Rotation

◄► Counter 4:00
Final polishing OMEGA Etosil E, 0.06 µm* 120-150 25
Rotation (ethanol during final 0:30)

Optional: OMEGA
Etosil E, 0.06 µm* 20:00
Final polishing Saphir Vibro

Optional: Approx. 0:03-0:10


Nital 3%**
Etching (chem.) (ethanol for 0:30)

* ATM Item No. 95005033 ** ATM Item No. 92002597

Notes:

BEGINNERS GUIDE Notes:

CUTTING • Use suitable cut-off wheels for magnesium material (e.g. ATM A wheels)
• Cutting speed max. 0.25 mm/s

MOUNTING • Use mounting material for almost gap-free mounting


• Hot or cold mounting both possible

GRINDING • Start grinding with SiC-paper/foil P320 (280)


• Continue with P800 and P1200
• Thoroughly wash samples and holder under running water after each grinding step
• Coat sample with paraffin wax before grinding to reduce the contamination by SiC particles
POLISHING • Rinse the polishing discs with water and spin dry after use
• Do not stack discs with different diamond sizes
• Clean samples, holders and hands under running water before each polishing step
• Wet the OMEGA polishing cloth with ethanol before polishing
• Use ethanol and blow dryer to avoid water stains
• Check after each step under the microscope if polishing marks are of equal size and randomly oriented
• Use the consumables only for printed circuit boards and not for other materials
• Rinse the spray nozzle of the Etosil E bottle after use, put cap on nozzle

SAMPLE MICROGRAPHS
OK Sample polished NOK Sample polished
20x micrograph of magnesioum 20x micrograph of magnesium 20x micrograph of magnesium,
after OMEGA polishing after Etosil polishing etched with Nital

• No traces of scratches • Sparse scratches from 0.06 µm Eposal after • No traces of scratches
• Clean homogeneous surface OMEGA • Clear structure
• Pores and inclusions with perfect edges »C  lean all polishing discs with clean brush
under running water
»C  lean sample and sample holder
»R  epeat OMEGA step

www.atm-m.com | Advanced Materialography

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