Ec 302
Ec 302
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fF/cm). (2)
2. a) Explain the limitations imposed by small device geometries. How do scaling
affect the doping concentrations and power density if constant voltage scaling is
applied to MOS device. Why does VT increase for a short channel device and show
an increasing trend for narrow width device? (3)
b) Consider an NMOS transistor with the following parameters: ta 6 nm, L =
0.24 mm, W = 0.36 mm, drain (LD) and sourçe (Ly lengths = 0.625 mm, Co =
2xi0 F/m, Cavo2.75 10-°F/m. Determine the zero-bias value of all relevant
capacitances. (s=8.85 x 101* F/cm, Eox3.9e, and neglect overlap capacitance). (2)
3. a) Design a depletion load inverter with specifications as: VpD = 5V, VoL 0.2 V,
VTedriver IV and VTload-3V and power consumption of ImW. Find the widths of
driver and load transistor if both transistors have same channel length. 3)
b) Write down the equations (and only those) which are needed to determine the
voltage at node X in Fig. 1. Do NOT plug in any values yet. Neglect short channel
efiects and assume that Ap =0. Detemine the required width of the transistor (for L
=0.25 um) such that Xequals 1.5 V. k=304 AN?, VR--0.4 V. (2)
25 V
R 20 k
Fig.1
4. Consider a CMOS inverter that is designed in a process with the
parameters: ka' = 100uA/V, kp' = 40uAW, VTon= +0.7v and VTop= -0.8v. The
following
transistors have aspect ratios of(WL)»= 10 and (W/L), 15 and the
power supply
=