Signal A
Signal A
Signal A
Outline
• Introduction (A. Deutsch)
– The interconnect bottleneck in high-speed systems
• Interconnect Modeling Fundamentals
(A.Cangellaris/U. Ravaioli)
– Time-domain & frequency-domain transmission line analysis
– Lossy lines and signal dispersion
– Crosstalk for short lengths of coupled interconnects
• On-Chip Interconnects (A. Deutsch)
– Modeling of on-chip interconnects
– Interconnect impact on system performance
– Future trends
Fundamentals of
Transmission Line Theory
I(z,t)
Generic symbol for
V(z,t) a two-conductor line
(+++++)
z ∆z
DAC 2001 8
Transmission-Line Parameters
• Per-unit-length capacitance C
• Per-unit-length conductance G
• Per-unit-length inductance L
– Loop inductance
– Frequency dependence due to Current Loop
skin effect
• Per-unit-length resistance R
∆z
– Strong frequency dependence
due to skin effect
1 + 1 −
Current wave: i ( z , t ) = f ( z − v pt ) − f ( z + v pt )
Z0 Z0
forward wave backward wave
L
where Z 0 = is the characteristic impedance of the line.
C
DAC 2001 11
VS (t ) = V + (0, t ) + I + (0, t ) RS + Z0
⇒ V (0, t ) = V ( t )
Z 0 + RS
S
V + (0, t ) = Z 0 I + (0, t )
Z02 − Z01
V − = ΓV + V ++ = TV + Reflection Coefficient: Γ=
Z02 + Z01
− V − and ++ V ++
I =− I = 2Z02
Z01 Z02 Transmission Coefficient: T =
Z02 + Z01
Maintaining a fairly constant value of the characteristic impedance
along an interconnect path is essential for reflection suppression.
Vs ZS(f) Z0 ZL(f)
3T Slow response
ΓL ΓSΓL V+
~6V+
4T ~4V+
t Bounce diagram t 2V+
T 3T 5T t
DAC 2001 15
(V-, I-) C
IL =
1
Z0
(V + −V − )
L
dVL
Interconnect delay = T I L = CL , VL (t = T ) = 0.
dt
VL (t ) = V + (1 − exp( − (t − T ) / τ ) ) , t > T
where τ =Z 0 C .
Let Td be the time at which VL (t = Td ) = 0.9V + .
Td = T + 2.3τ ⇒
Extra delay due to the capacitor is 2.3Z 0 C
Wire bonds
(primarily inductive) Interconnect bends
Via
(primarily capacitive)
(primarily inductive)
Z0 Z0 Z0 Z0
C Z0 Z0 L Z0
Z0
(C=1 pF, Z 0 = 50 Ohm; Td = 57.5 ps) ( L = 2.5 nH, Z 0 = 50 Ohm; Td = 57.5 ps)
DAC 2001 19
interconnect
The return current in the ground plane
flows around the slot. Hence,
• Extra L ⇒ extra delay
• Unbalanced currents lead to
enhanced emissions Ground plane
• Interference (crosstalk) with
other wires beyond immediate Interference occurs on
neighbors either side of the plane
- Conduction (return)
current
I2 I1 − I 2
Transmission-Line
Model ID
Differential-mode current: I D =
2
I +I
+
- ID
Common-mode current: I C = 1 2
-
2
I1 = I C + I D
Radiated emissions calculation
can be grossly incorrect if the I 2 = IC − I D
common-mode current is not
taken into account
DAC 2001 © SEMCHIP 21
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Plots generated using UIUC’s fast time-domain solvers (Prof. E. Michielssen)
*
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)(
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+,)
+,",)
!"#$%&
Return current
Per-unit-length inductance, L, increases.
Per-unit-length capacitance, C , decreases.
L
Z0 = increases
C
Grid Plane
(cross section)
Advantages
-Better impedance control
-Reduced cross-plane interference
V ( z , ω ) = V + (ω ) exp( −γ z ) + V − (ω ) exp(γ z )
General solution : 1
I ( z , ω ) = Z (ω ) V (ω ) exp( −γ z ) − V (ω ) exp(γ z )
+ −
0
The characteristic impedance and the phase velocity are frequency dependent:
R (ω ) + jω L(ω ) ω
Z 0 (ω ) = , v p (ω ) =
G (ω ) + jω C β (ω )
Input Output
Lossy line
Pulse Pulse
DAC 2001 29
Zg Z0
Skin-Effect Resistance
Skin effect
At frequencies such that the skin depth is At high frequencies, where the skin
larger or comparable with the conductor depth is smaller than the conductor
thickness, the current distributes uniformly thickness, current crowding around
over the conductor cross section. the perimeter occurs.
1
Skin depth: δ =
π f µσ
• At f = 1 GHz, for aluminum with conductivity σ = 4×107 S/m and
permeability µ = 4π × 10-7 H/m, the skin depth is 2.5 µm.
• For high enough frequencies, the p.u.l. resistance increases as √f
R per-unit-length (Ohms/cm)
Frequency dependence
of the p.u.l. resistance 3
PEC reference planes
(top) and inductance Copper reference plane
2
(bottom) of the single
stripline configuration 1
with w=50 µm, t=10 µm,
0
g=10 µm, and h=100 µm. 10
-2 -1
10
0
10
1
10
Frequency (GHz)
L per-unit-length (Ohms/cm)
3.4
3.2
3
2.8
-2 -1 0 1
10 10 10 10
Frequency (GHz)
4.5
1 t 2.5
2
s h
1.5
R11 R12
2 1
0.5
g 0
-4 -3 -2 -1 0 1
10 10 10 10 10 10
Frequency (GHz)
3.5
0.5
DAC 2001 10
-4
10
-3
10
-2
10
-1
10
0 3510 1
Frequency (GHz)
1
90% 0.15
0.8
0.1
Voltage (V)
Voltage (V)
0.6
0.05
0.4
~ 1 ns 0
0.2
0 -0.05
0 0.2 0.4 0.6 0.8 1 0 0.2 0.4 0.6 0.8 1
Time (sec) -8 Time (sec) -8
x 10 x 10
Cross-section of a stripline
geometry.
s=50 µm, w=50 µm,
t=10 µm, g=10 µm,
h=200 µm and εr=4.
Copper metallization.
DAC 2001 42
Crosstalk in Coupled Lines
• For interconnects with more than two (active) conductors,
crosstalk analysis is most effectively performed in terms of a
circuit simulator that can support MTL models (*).
– Most common (and computationally efficient) SPICE
equivalent circuits for MTL assume lossless transmission
lines.
– Models for MTLs with losses (including frequency-dependent
losses associated with skin effect) are available also. They are
essential for accurate analysis of interconnect-induced delay,
dispersion, and crosstalk at the board level for signals of GHz
bandwidths.
– It is assumed that the interconnect structure is uniform
enough for its description in terms of per-unit-length L,C,R,
and G matrices to make sense.
(*) V.K. Tripathi and J.B. Rettig, “A SPICE Model for Multiple Coupled Microstrips and Other
Transmission Lines,” IEEE Trans. Microwave Theory Tech., vol. 33(12), pp. 1513-1518,
Dec. 1985.
sin β l M CM
where, C = cos β l , S = , k= = ≤ 1, and
βl LG LR CG CR
DAC 2001 45
jω RNE
VNE = VNE
IND
+ VNE
CAP
= ( Ml + (RFE RL )CM l )
D ( RNE + RFE )( RS + RL )
jω RNE
VFE = VFINE D + VFE
CAP
= ( −Ml + (RNE RL )CM l )
D ( RNE + RFE )( RS + RL )
Notice that:
• The higher the frequency the larger the crosstalk
• Inductive coupling dominates for low-impedance loads
• Capacitive coupling dominates for high-impedance loads
L L
C C/2 C/2
0.62 0.62
For a = 0.05, ωmax = = .
LC d Lp.u.l C p.u.l .
Application: d = 2 cm, Lp.u.l . = 4 nH/cm, C p.u.l = 1 pF/cm; ωmax = 4.9 GHz