The Role of Hydroquinone Monomethyl Ether in The Stabilization of Acrylic Acid
The Role of Hydroquinone Monomethyl Ether in The Stabilization of Acrylic Acid
The Role of Hydroquinone Monomethyl Ether in The Stabilization of Acrylic Acid
10, 12271231
Holger Becker1
Herbert Vogel1
1
Department of Chemistry,
Ernst-Berl-Institute for
Technical Chemistry and
Macromolecular Science,
University of Technology
Darmstadt (TUD), Germany.
1227
Research Article
Introduction
1.1
Acrylic acid (AA) is an intermediate product which is produced on an industrial scale. The world annual production
amounts to ca. 3.4 million t a1 (in 1994, ca. 2 million t a1) [1,
2]. In the last few years, the consumption of acrylic acid has
increased immensely, mainly due to the great increase in demand for super absorber polymers.
The inadvertent polymerization of acrylic acid is caused by
radicals (impurities, UV radiation, cosmic radiation etc.). The
strongly exothermic polymerization (DHR = 76 kJ mol1)
constitutes a significant safety risk during production, workup, as well as in storage and transportation. On the one hand,
the released heat can cause deflagration and explosions. On
the other hand, the polymers can lead to blockages and breakdowns in parts of the production plant, leading to losses in
production and higher maintenance costs. Therefore, acrylic
acids, e.g., phenothiazin, hydroquinone monomethyl ether
(MeHQ), and/or molecular oxygen (O2) are added as poly-
Correspondence: Prof. Dr.-Ing. H. Vogel (vogel@ct.chemie.tu-darmstadt.de), Department of Chemistry, Ernst-Berl-Institute for Technical
Chemistry and Macromolecular Science, Darmstadt University of
Technology (TUD), Petersenstrae 20, D-64287 Darmstadt, Germany.
merization inhibitors [3]. Under storage and process conditions, MeHQ is introduced in combination with dissolved O2.
Here, the MeHQ does not react directly with the primary radicals (R.); the primary inhibitor is the dissolved molecular oxygen. The underlying mechanisms of how the O2/MeHQ stabilizer system acts, is as follows: The primary radicals react with
O2 to form peroxide radicals (RO2.). These are then be
trapped up by the reaction with MeHQ [4] (see Scheme 1).
Based on the consumption of the oxygen and MeHQ, conclusions can be drawn on the stability of the monomers. Thus,
it was an objective of this work to study the kinetics of the O2
and MeHQ consumption during the inhibition period in
acrylic acid. In order to judge the role of the acrylic acid, as a
comparison, measurements were made in acetic acid (HAc),
which has similar solvent properties to acrylic acid but cannot
+ O2
RO2
+ HO
RO2
OCH3
RO2H +
OCH3
OOR
RO2
OCH3
O
OCH3
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1228
H. Becker et al.
polymerize naturally. From the determined consumption kinetics, an improvement in the prediction of the stability of
acrylic acid should be possible.
1.2
dO2
dt
dM
k4
dt
with : I
2RO2
k6 =Lmol 1 s
M RO2
k1 =s
s
2 k1
I M const:
k6
MeHQ Analysis
For the quantitative determination of MeHQ and its degradation products, a HPLC device (Model HP 1090 Series L Liquid
Chromatograph) with a UV-VIS detector (Filter Photometric
Detector) was used. A modified RP18 column [NC-03 (250
3.0 mm) PRONTOSIL 120-3-C18-AQ 3.0-956m] was used.
The standard mobile phase was a mixture of 40 % (L/L) acetonitrile and 60 % (L/L) water (Flow rate: 0.5 mL min1). The
UV detector was operated at 280 nm (absorption maximum of
MeHQ). The column was operated at 50 C and the injection
volume was varied according to the MeHQ concentration.
! 2R
! RO2 O2 R
k4 =Lmol 1 s
2.2
Equipment
Producer
O2-sensor
(electrochemical)
Pumps
AD-transducer
Thermostats
! RO2 M
Experimental
2.1
The apparatus and devices used for the O2/MeHQ consumption measurements are described extensively in the literature
[4, 8]. The chemicals used and their pre-treatment are also to
be found there, and are stated in more detail.
Mass Flow Controller MFC 5850 TR, N2 von 05 L/min, Fa. Brooks
Instrument B. V., Veenendaal, The Netherlands
HPLC system
HPLC software
3.1
MeHQ Consumption
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Acrylic acid
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Purity
Company
99100 %
MeHQ
> 98 %
PTZ
> 99 %
Nitrogen
Acetonitrile 99.99 %
Water
bidistilled
110
100
A1-MeHQ
60
A3-MeHQ
70
A2-MeHQ
80
MeHQ
mVolts
90
50
44
2.5
5.0
7.5
10.0
12.5
Minutes
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H. Becker et al.
3.2
Examination of the Arrhenius plot shows that the consumption of MeHQ in acetic acid is thus well described. In acrylic
acid, however, anomalies arise at higher temperatures (see
Fig. 5).
This can be explained as change in the mechanisms of the
radical formation, since at higher temperatures more radicals
can be generated through the decomposition of the copolymers formed from O2 and acrylic acid (-O2-AA-O2-AA-). This
causes a higher consumption of MeHQ. From a temperature
of 80 C, the gradient (which corresponds to a decrease in EA)
of the Arrhenius curve flattens. This flattening serves as an indication of the change in the governing mechanisms.
With the help of the Arrhenius plots, the rate constants
kges.(MeHQAA) can be estimated at temperatures higher than
90 C by extrapolation; the MeHQ consumption under the
conditions of the acrylic acid workup can be calculated (100
130 C). Thus, along with the knowledge of the O2 consumption, one possesses another parameter for monitoring the production process.
Figure 6. O2 () and MeHQ () consumption rates in a continuously operated stirred tank reactor as a function of temperature (VR = 5079 mL, VWZ = 820 h, T = 4090 C).
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Conclusions
Acrylic acid
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Acknowledgements
We would like to thank BASF AG, Ludwigshafen, Germany, for
financial support.
References
[1] Markets & Economics, Acrylic Acid, Chemical Week, 2001,
January.
[2] H. Vogel, CHEManager 2001, 34.
[3] W. Kurze, F. Raschig, Ullmans Enzyklopdie der Technischen
Chemie, Bd. 8, Antioxidantien, Verlag Chemie, Weinheim
1975, 19.
[4] S. Schulze, H. Vogel, Chem. Eng. Technol. 1998, 21 (10), 829.
[5] P. Gladyshev, D. K. Kitaeva, V. A. Popov, E. I. Penkov, Proc.
Acad. Sci. USSR 1974, 215, 354.
[6] J. J. Kurland, J. Polym, Polym. Sci. 1980, 18, 1139.
[7] H. Becker, H. Vogel, Chem. Eng. Technol. 2002, 25 (5), 547.
[8] H. Becker, H. Vogel, Chem. Eng. Technol. 2004, 27 (10), 1122.
DOI: 10.1002/ceat.200302114
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