The ZSX Primus 400 is a wavelength dispersive X-ray fluorescence spectrometer designed for analyzing large samples up to 400mm in diameter and 30kg in mass. It features an adaptable sample stage system and measurement spots that can be varied between 30mm and 0.5mm in diameter. The instrument allows for micro-mapping of samples and optional equipment includes a camera and lighting for viewing samples, as well as diffraction interference rejection for analyzing single crystal substrates. It can detect elements from beryllium to uranium with high precision and is suited to applications such as analyzing sputtering targets and thin films.
The ZSX Primus 400 is a wavelength dispersive X-ray fluorescence spectrometer designed for analyzing large samples up to 400mm in diameter and 30kg in mass. It features an adaptable sample stage system and measurement spots that can be varied between 30mm and 0.5mm in diameter. The instrument allows for micro-mapping of samples and optional equipment includes a camera and lighting for viewing samples, as well as diffraction interference rejection for analyzing single crystal substrates. It can detect elements from beryllium to uranium with high precision and is suited to applications such as analyzing sputtering targets and thin films.
The ZSX Primus 400 is a wavelength dispersive X-ray fluorescence spectrometer designed for analyzing large samples up to 400mm in diameter and 30kg in mass. It features an adaptable sample stage system and measurement spots that can be varied between 30mm and 0.5mm in diameter. The instrument allows for micro-mapping of samples and optional equipment includes a camera and lighting for viewing samples, as well as diffraction interference rejection for analyzing single crystal substrates. It can detect elements from beryllium to uranium with high precision and is suited to applications such as analyzing sputtering targets and thin films.
The ZSX Primus 400 is a wavelength dispersive X-ray fluorescence spectrometer designed for analyzing large samples up to 400mm in diameter and 30kg in mass. It features an adaptable sample stage system and measurement spots that can be varied between 30mm and 0.5mm in diameter. The instrument allows for micro-mapping of samples and optional equipment includes a camera and lighting for viewing samples, as well as diffraction interference rejection for analyzing single crystal substrates. It can detect elements from beryllium to uranium with high precision and is suited to applications such as analyzing sputtering targets and thin films.
Elemental analysis by XRF of large objects with micro-mapping
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ZSX Primus 400
Rigaku's unique ZSX Primus 400 sequential
wavelength dispersive X-ray fluorescence (WD- XRF) spectrometer was specifically designed to handle very large and/or heavy samples. Accepting samples up to 400 mm diameter, 50 mm thick and 30 kg mass, this system is ideal for analyzing sputtering targets, magnetic disks, or for multilayer film metrology or elemental analysis of large samples.
XRF with customized sample adapter system
Having the versatility to adapt to your specific
sample types and analysis needs, this WDXRF spectrometer is adaptable to various sample sizes (/products/xrf/formview) and shapes using optional (made to order) adapter inserts. With a variable measurement spot (30 mm Features to 0.5 mm diameter, with 5-step automatic selection) and mapping capability with multi-point Large sample analysis measurements to check for sample uniformity, this Up to 400 mm (diameter) uniquely flexible instrument can dramatically Up to 50 mm (thickness) streamline your quality control processes. Up to 30 kg (mass) Sample adapter system XRF with available camera and special lighting Adaptable to various sample sizes Measurement spot Optional real-time camera allows the analysis area 30 mm to 0.5 mm diameter to be viewed within software. The operator has 5-step automatic selection complete certainty as to what is being measured. Mapping capability Allows multipoint measurements Traditional WDXRF analytical capabilities Sample view camera (option) General purpose All analytical capabilities of a traditional instrument are retained in this "large sample" variant. Analyze Analyze Be - U Elemental range: ppm to % beryllium (Be) through uranium (U) with high- resolution, high-precision WDXRF spectroscopy, Thickness range: sub to mm Diffraction interference rejection (option) from solids to liquids and powders to thin films. Analyze wide composition ranges (ppm to tens of Accurate results for single-crystal substrates percent) and thicknesses (sub to mm). Optionally available is diffraction peak interference rejection, Compliance with industry standards SEMI, CE marking for optimal results for single-crystal substrates. Rigaku ZSX Primus 400 wavelength dispersive X- Small footprint 50% footprint of the previous model ray fluorescence (WD-XRF) spectrometer complies with industry standards SEMI and CE.
Isolation films: SiO2, BPSG, PSG, AsSG, SiN, SiOF, SiON, etc. High-k and ferro-dielectric films: PZT, BST, SBT, TaO, HfSiOx Metal films: Al-Cu-Si, W, TiW, Co, TiN, TaN, Ta- Al, Ir, Pt, Ru, Au, Ni, etc. Electrode films: doped poly-Si (dopant: B, N, O, P, As), amorphous-Si, WSix, Pt, etc. Other doped films (As, P), trapped inert gas (Ne, Ar, Kr, etc.), C (DLC) Ferroelectric thin films, FRAM, MRAM, GMR, TMR; PCM, GST, GeTe Solder bump composition: SnAg, SnAgCuNi MEMS: thickness and composition of ZnO, AlN, PZT SAW device process: thickness and composition of AlN, ZnO, ZnS, SiO2 (piezo film); Al, AlCu, AlSc, AlTi (electrode film)
ZSX Primus 400 accessories
Sample camera with special lighting allows the
analysis point to be viewed on screen Diffraction interference rejection provides accurate results for single-crystal substrates Fundamental Parameters software for thin film analysis
