The PN Junction: D DP DN DP N DN N

Download as docx, pdf, or txt
Download as docx, pdf, or txt
You are on page 1of 3

The PN junction

The total charge on each side of a PN Junction must be equal and opposite
to maintain a neutral charge condition around the junction. If the depletion
layer region has a distance D, it therefore must therefore penetrate into the
silicon by a distance of Dp for the positive side, and a distance of Dn for the
negative side giving a relationship between the two of: Dp*NA = Dn*ND in
order to maintain charge neutrality also called equilibrium.

PN Junction Distance
As the N-type material has lost electrons and the P-type has lost holes, the
N-type material has become positive with respect to the P-type. Then the
presence of impurity ions on both sides of the junction cause an electric
field to be established across this region with the N-side at a positive
voltage relative to the P-side. The problem now is that a free charge
requires some extra energy to overcome the barrier that now exists for it to
be able to cross the depletion region junction.
This electric field created by the diffusion process has created a “built-in
potential difference” across the junction with an open-circuit (zero bias)
potential of:

Where: Eo is the zero bias junction voltage, VT the thermal voltage of 26mV
at room temperature, ND and NA are the impurity concentrations and ni is
the intrinsic concentration.
A suitable positive voltage (forward bias) applied between the two ends of
the PN junction can supply the free electrons and holes with the extra
energy. The external voltage required to overcome this potential barrier that
now exists is very much dependent upon the type of semiconductor
material used and its actual temperature.
Typically at room temperature the voltage across the depletion layer for
silicon is about 0.6 – 0.7 volts and for germanium is about 0.3 – 0.35 volts.
This potential barrier will always exist even if the device is not connected to
any external power source, as seen in diodes.
The significance of this built-in potential across the junction, is that it
opposes both the flow of holes and electrons across the junction and is why
it is called the potential barrier. In practice, a PN junction is formed within
a single crystal of material rather than just simply joining or fusing together
two separate pieces.
The result of this process is that the PN junction has rectifying current–
voltage (IV or I–V) characteristics. Electrical contacts are fused onto either
side of the semiconductor to enable an electrical connection to be made to
an external circuit. The resulting electronic device that has been made is
commonly called a PN junction Diode or simply Signal Diode.
Then we have seen here that a PN junction can be made by joining or
diffusing together differently doped semiconductor materials to produce an
electronic device called a diode which can be used as the basic
semiconductor structure of rectifiers, all types of transistors, LED’s, solar
cells, and many more such solid state devices.
In the next tutorial about the PN junction, we will look at one of the most
interesting applications of the PN junction is its use in circuits as a diode.
By adding connections to each end of the P-type and the N-type materials
we can produce a two terminal device called a PN Junction Diode which
can be biased by an external voltage to either block or allow the flow of
current through it.

You might also like

pFad - Phonifier reborn

Pfad - The Proxy pFad of © 2024 Garber Painting. All rights reserved.

Note: This service is not intended for secure transactions such as banking, social media, email, or purchasing. Use at your own risk. We assume no liability whatsoever for broken pages.


Alternative Proxies:

Alternative Proxy

pFad Proxy

pFad v3 Proxy

pFad v4 Proxy