Semiconductor Lasers For Optical Communication
Semiconductor Lasers For Optical Communication
Semiconductor Lasers For Optical Communication
1. Introduction
Recent years have seen considerable progress in the area of optoelectronic devices
which are to be used in the optical fibre communication systems. State-of-the-art
silica fibres have minimum dispersion and transmission loss (0.2 dB/km) at 1.3 and
1.55 ~m wavelength respectively (figure l j. Semiconductor emitters and detectors
operating at these wavelengths are therefore very important. G a l n A s P lasers having
very low threshold currents for continuous wave ICW) operation at room temperature
have been successfully developed for these wavelengths. More recently, optical fibres
made of heavy-metal fluoride glasses are predicted to have transmission losses one to
two orders of magnitude smaller than that of the best silica fibres. The minimum loss in
these materials is expected to occur at the mid-infrared wavelengths 12-4 llm)l Lines
1984; Tran et al 1984). Optoelectronic materials and devices for these wavelengths
are currently being investigated. GalnAsSb lasers for 2.2 llm wavelength have been
demonstrated recently. This rcvicw will locus on semiconductor lasers. After a brief
introduction to the double hetcrostructure, some of the important laser structures
like buried heterostructures (BHI and distributed feedback ~DFB) structure, which
have been realised using GalnAsP, will be described. Finally, recent progress in
GalnAsSb lasers for mid-infrared wavelengths -~iI1 be summarised.
G a l n A s P lasers are discussed in the following sections (Pearsail 1982; Agrawal and
Dutta 1986).
The basic structure of a p-n junction laser is shown in figure 2a. A pair of parallel
planes are cleaved perpendicular to the plane of the junction. The two remaining
sides of the diode are roughened to eliminate lasing in direction other than the
main one. The structure is called a F a b r y - P e r o t cavity. When a forward bias is
applied to the laser diode, current flows and minority carriers are injected across
the junction. Initially, at low currents, there is spontaneous emission in all
151
152 A K Srivastava
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Figure I. Attenuation and dispersion characteristics of a single mode silica fibre
Current flow
Coherent (a)
radiation
Current /~ Contact
i / p/~- dielectric
'~/Confinement (b)
Active .~ layers
layer ~ _ Subetrate
Laser Contact
beam
Figure 2. (a) Basic structure of a p-n junction laser in the form of a Fabry Perot
cavity. (b) Structure of a double heterostructure (DH) stripe laser.
r-. l 1
2 0 ..... ; .......... i- . . . . . . . . . . . . i °'2
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Figure 4. Schematic of a multiple infill buried heterostructure (BH) laser.
made using two successive epitaxial growth steps. First a D H structure of GalnAsP
is grown on InP (100) substrate. Next, a glassy masking layer is deposited onto the
wafer and this is then photo-engraved leaving thin masking stripes running across
the entire wafer surface. Careful preferential etching then follows which reveals the
slow etching (111) oriented planes of the ridge giving a reduced widt:~ of the waist
( ~ I/am) below the top of the ridge. The active quaternary layer is arranged to
be close to the "waist" of the ridge. The wafer then goes through a second epitaxial
growth stage in which a series of p-type, intrinsic and n-type layers (or one thick
semi-insulating layer) of InP are deposited. These layers stack up the sides of the
ridge to produce a structure with cross-section as shown in figure 4. Thus the
quaternary active layer is cladded above, below and on the sides by layers of lower
refractive index and we have full optical confinement in the vertical and lateral
planes. The multilayers on either side of the active layer incorporate several reverse
biased p-i-n junctions (or the semi-insulating layer) which effectively block the
current spreading and thereby reduce threshold current. These structures have
threshold currents in the range 10-20 mA. The light-current characteristics of a
1.3/~m BH laser is shown in figure 5. These lasers can typically provide 10-20 mW
of power output per facet. The spectrum of a 1.3/~m BH laser is also shown in the
figure. As mentioned earlier, the laser wave-guide i3 designed to support only one
transverse mode in the vertical plane; In the horizontal plane, although in principle
several modes could propagate, scattering at the mesa edges preferentially
attenuates higher order modes and again limits operation to only one mode. The
spectrum therefore indicates single transverse mode with several longitudinal
Fabry-Perot modes separated by ~ 1 0 ~ . The frequency response of BH lasers
shows resonance at ~ 1 0 G H z implying a pulse modulation capability of these
lasers in the Gbit/s region. The spectral linewidth of BH lasers is however rather
large (2-5 ~) which makes it unsuitable for long haul communication systems. Of
the several schemes employed to reduce the spectral width, the most successful one
has been the distributed feedback (DFB) structure.
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curve of the laser (figure 5). These modes seriously limit the distance over which
communication can be made on the optical fibre due to chromatic dispersion.
Ideally one would like to have a single mode very narrow spectral-width laser for
such applications. Reducing the laser length increases the spacing of the Fabry-
Perot modes and is a possible solution but it increases the lasing threshold, makes
fabrication more difficult (typically lasers are 250/~m long) and makes it necessary
to use high reflection coatings on the laser facets. Figure 6a shows the schematic of
a DFB laser which overcomes this problem. The structure is made by etching a
fundamental or second order grating of period 0-2 to 0.4/~m in the material before
growth of the DH structure. As shown in figure 6b an optical wave travelling across
the active region is partially reflected at the peaks and valleys of the grating because
of the change in the effective refractive index sampled by the wave. Only that
wavelength for which this feedback interferes constructively is amplified and the rest
are suppressed. Spectral characteristics of DFB GalnAsP lasers show reduction in
the spectral width (-~0.1 ~,) and nearly total suppression of side bands. In addition,
the incorporation of the grating makes the emission wavelength almost independent
of temperature. These advantages of DFB lasers make them suitable for long
distance communication systems.
Figure 7 shows the layer structure of a GalnAsSb, AIGaAsSb DH laser. The layers
of the quaternary alloys GalnAsSb and AIGaAsSb are epitaxially grown on GaSb
substrate. In figure 3 the position of these alloys has been marked on a bandgap
156 A K Srivastava
CONFINI (a)
LAYERS
\
.~ ~ ~ ~ > Tr-Anlzn
-T T -T
nt L nz nt nz
// Au- In- Zn
, / ,/TilAglAu
///////// / / / ~ / / / / / / / //'/-~ .-- S i N x
p-AIGoAsSb
p- GoTnAs Sb
n-AI GaAs Sb
n-GaSb: Te Substrate
"////////////dd//////////////, In-Au
Several crystal growth techniques (LPE, MOCVD and MBE) have been
employed to grow GalnAsSb on a GaSb substrate. However, the best results have
been obtained by LPE (DeWinter et al 1985). DH lasers have been successfully
grown by LPE on n-type, (100) oriented GaSb substrates in a conventional
horizontal-slider/graphite boat apparatus at 530°C (Caneau et al 1985). Early work
on GalnAsSb/A1GaAsSb DH lasers resulted in room temperature, pulsed Jth values
of 5 kA/cm 2 at 1.8/am wavelength (Kobayashi et al 1980) and CW operation of
2"0/am lasers only at 80 K (Kano and Sugiyama 1980). Room temperature lasers for
longer wavelengths have been reported with Jth values of 14 kA/cm 2 at 2"02/am and
20 kA/cm 2 at 2"29 klm (Bochkarev et al 1985).
Recently, pulsed room temperature 2.2 microns lasers with Jth values as low as
3"5 kA/cm 2 have been reported (Caneau et al 1986a), These lasers operated CW up
to 235 K temperature (Caneau et al 1987). The laser structure used in this work con-
sisted of an active layer of Gao.s4Ino. 16Aso.isSbo.s5 between two AI~,Ga1_:,AsySbl _y
confinement layers, lattice-matched to GaSb substrate. Two compositions for the
confinement layers were used: for one type of structure (DH-I), x=0.27 and
y = 0"04, and for the other (DH-II), x = 0-34 and y = 0'04. Figure 8 shows the light
output vs current (L-l) curve of a DH-I laser with 1/am thick active layer. The
inset shows a low-resolution spectrum of the laser output with a peak wavelength of
2"2/am. For DH-I lasers the lowest Jth value was 6'9 kA/cm 2 and this occurred for
an active layer thickness (d) of 0"8 to 1"0/am, while for DH-II lasers, the optimal
thickness was found to be 0.5/am and resulted in dth value of 3"5 kA/cm 2. The lower
Jth and smaller optimum d values for DH-II lasers as compared to DH-I lasers
result primarily from improved optical confinement by more Al-rich confinement
layers. Further reduction in Jth value (1"7 kA/cm 2) for these lasers has been recently
reported (Caneau et al 1987). Figure 9 shows the L - I curves for DH-II lasers
operated under CW conditions at various temperatures. CW operation was
achieved up to 220 K with a threshold current of 125 mA. The same laser mounted
with improved soldering for more effective heat sinking operated CW at
temperatures up to 235 K. The characteristic temperature To was measured to be
55 K and 80 K for DH-I and DH-II lasers respectively. More recently (Joullie et al
1988), To has been reported to be 90 K for these lasers. Figure 10 shows the
>-
Z
W
}.-
Z
/ I
ROOM
I
TEMPERATURE
I
CURRENT (mA)
i i
15 CWOPERATION
200K 220K
210K ~
I.- IO
Q..
I--
0 5
I--
T
(..9
--1
S I
0 50 I00
CURRENT (mA)
Figure 9. CW light output vs current curves for a DH-II laser at different temperatures.
T = 140K 2 3 8 6 S-12
d= 1/./.m
S = 14/.¢m
F-q
X.A~ 2,023/zm
Figure 10. Emission spectrum of a GalnAsSb stripe laser operated under quasi-CW
conditions at 140 K.
4. Summary
References
Agrawal G P and Dutta N K 1986 in Long wavelength semiconductor lasers (New York: Van Nostrand
Reinhold)
Bochkarev A E, Dolginov L M, Drakin A E, Druzhinina L V, Eliseev P G and Sverdlov B N 1985 Sot.
J. Quantum Electron. 15 86
Caneau C, Srivastava A K, Dentai A G, Zyskind J L, Burrus C A and Pollack M A 1986a Electron. Lett.
22 992
Caneau C, Srivastava A K, Dentai A G, Zyskind J L and Pollack M A 1985 Electron. Lett. 21 815
Caneau C, Srivastava A K, Zyskind J L, Sulhoff J W, Dentai A G and Pollack M A 1986b Appl. Phys.
Lett. 49 55
Caneau C, Zyskind J L, Sulhofl J W, Glover T E, Centanni J, Burrus C A, Dental A G and Pollack M A
1987 Appl. Phys. Lett. 51 764
DeWinter J C, Pollack M A, Srivastava A K and Zyskind J L 1985 J. Electron. Mater. 14 729
Joullie A, Alibert C, Mani H, Pitard F, Tournie E and Boissier G 1988 Electron. Lett. 24 1076
Kano H and Sugiyatna K 1980 Electron. Lett. 16 146
Kobayashi N, Horikoshi Y and Uemura C 1980 Jpn. J. Appl. Phys. 19 L30
Lines M E 1984 Science 226 663
Pearsall T P 1982 GalnAsP alloy semiconductors (New York: John Wiley & Sons)
Tran D C, Sigel G H .It and 8endow B 1984 ./. Liqhtwave Technol. LT-2 566