Filmetrics Datasheet F54

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F54

Thin-Film Mapping Analyzer

The Filmetrics Advantage Automated Thin-Film Thickness


• World’s leader in tabletop thin-film Mapping System
   measurement
Thin-film thickness of samples up to 450 mm in diameter are
• 24-hour phone, e-mail, and online support
mapped quickly and easily with the F54 advanced spectral
• Intuitive analysis software standard with reflectance system. The motorized r-theta stage moves
every system automatically to selected measurement points and provides
thickness measurements as fast as two points per second. The
Additional Features F54 has the same precision high-lifetime stage that performs
• Built-in online diagnostics millions of measurements in our production systems.
• Standalone software included
Choose one of dozens of predefined polar, rectangular, or linear
• Sophisticated history function for saving,
map patterns, or create your own with no limit on the number
reproducing, and plotting results of measurement points. The entire desktop system is set up in
minutes and can be used by anyone with basic computer skills.

Example Layers
Virtually any smooth, non-metallic film may be measured.
Examples include:
SiO2 SiNX DLC Polysilicon
Photoresist Polymer Layers Polyimide Amorphous Silicon

Example Applications
Semiconductor Fabrication LCD
Photoresist Cell Gaps
Oxides/Nitrides/SOI Polyimide
Wafer Backgrinding ITO
MEMS Optical Coatings
Photoresist Hardness Coatings
Silicon Membranes Anti-Reflection Coating
AIN/ZnO Thin-Film Filter Filters
A KLA Company
F54
Thin-Film Mapping Analyzer

Measurement Specifications F54-UV F54-UVX F54 F54-EXR F54-NIR


Thickness Range with 5X Objective*: - - 20nm-40μm 20nm-120μm 100nm-120µm
Thickness Range with 10X Objective*1: 4nm-35µm 4nm-115µm 20nm-45μm 20nm-115μm 100nm-115µm
Thickness Range with 15X Objective*1: 4nm-30μm 4nm-100μm 20nm-40μm 20nm-100μm 100nm-100µm
Thickness Range with 50X Objective*: - - 20nm-2μm 20nm-4μm 100nm-4µm
Min. Thickness to Measure n and k * : 2
50 nm 50 nm 100 nm 100 nm 500 nm
Accuracy*: The Greater of 1 nm or 0.2% 1 nm or 0.2% 2 nm or 0.2% 2 nm or 0.2% 3 nm or 0.4%
Precision3: 0.02 nm 0.02 nm 0.2 nm 0.02 nm 0.1 nm
Stability4: 0.05 nm 0.05 nm 0.05 nm 0.05 nm 0.12 nm
General Specifications
Spectrometer Wavelength Range: 190-1100 nm 190-1700 nm 380-1050 nm 380-1700 nm 950-1700 nm
Light Source: External D2 + Halogen Internal Halogen
Dimensions: 14W x 19D x 22H (in)
35.5W x 48.3D x 55H (cm)
Weight: 41 lbs. (19 kg)
Power Requirements: 100 - 240 VAC, 50 - 60 Hz, 230 W
500 μm 250 μm 100 μm 50 μm
Computer Requirements Spot Size
Aperture Aperture Aperture Aperture
Processor Clock Speed: 1.4 GHz min
5X Objective: 100 μm 50 μm 20 μm 10 μm
Interface: USB 2.0
Operating System 10X Objective: 50 μm 25 μm 10 μm 5 μm
PC: Windows XP (SP2) - Latest Windows (64-bit) 15X Objective: 33 μm 17 μm 7 μm 3.5 μm
Mac: OS X Lion - Latest Mac OS running Parallels 50X Objective: 10 μm 5 μm 2 μm 1 μm
200 mm Chuck 300 mm Chuck
* Material and microscope dependent
1
Reflective objective Sample Size: ≤ 200 mm diameter ≤ 300 mm diameter
2
Using 5X objective
3
1σ of 100 measurements of 1 µm SiO2-on-Si. Value is average of 1σ Speed (Typical 5 points - 5 sec. 5 points - 8 sec.
over 20 days. with Vacuum 25 points - 14 sec. 25 points - 21 sec.
4
2σ of daily average of 100 measurements of 1 µm SiO2-on-Si, Chuck): 56 points - 29 sec. 56 points - 43 sec.
measured over 20 days.

Filmetrics – A KLA Company


10655 Roselle St., San Diego, CA 92121
Tel: (858) 573-9300 Fax: (858) 573-9400
www.filmetrics.com
A KLA Company Specifications subject to change without notice ©2019 KLA Corporation Rev. 08.18 Printed in the USA

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