Bringing Answers To The Surface: 3D Measuring Laser Microscope
Bringing Answers To The Surface: 3D Measuring Laser Microscope
Bringing Answers To The Surface: 3D Measuring Laser Microscope
OLS4100
LEXT OLS4100
Widely used in quality control, research, and development across an array of industries and applications,
OLYMPUS LEXT 3D measuring laser microscopes have set new standards in 3D laser microscopy. Now, as
demand grows for increased measurement precision and wider observation applicability, Olympus has
responded with the new LEXT OLS4100. Designed to facilitate faster, easier measurement and higher-quality
imaging, the OLS4100 is expanding the boundaries of laser microscopy.
The new OLYMPUS LEXT OLS4100. Going beyond the borders of possibility.
Contents
Superior
Metrology
High-Quality
Imaging
Systematic Workflow
via intuitive GUI
Superior Metrology
High-Quality Imaging
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16
22
Sample Applications
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Contact Surface
Roughness
Measurement R: 2 m
Non-Contact
Laser Microscope
R: 0.2 m (OLYMPUS)
Roughness Gauge
Samples
With an LSM, the sample can be safely returned to the production line or
experiment thanks to non-destructive measurement.
Laser
Microscope
R:0.2m
(OLYMPUS)
128 x 128 m
LSMs have superior horizontal resolution due to a confocal optical system, making it easy to
measure the surface of the specific region of interest.
Sliced Image
Z Position
Z1
Sample Form
Z2
Z3
Z4
Z-axis Profile
Z-Axis Image
Z1
Z2
Z3
Z4
Interferometer
Samples
LSMs are ideal for measuring the surface contour of samples with
undulations ranging from several hundred micro-meters to the submicron
order.
Superior Metrology
3D measurement of diverse samples with 10 nm height resolution and
advanced measurement parameters.
Optical axis
Optical axis
LEXT-Dedicated Objective
Aberration
2.5
2.0
1.5
1.0
0.5
0.0
-0.5
-1.0
-1.5
-2.0
-2.5
(MPL APON50XLEXT)
STEP Height standard Type B, PTB-5, Institut fr Mikroelektronik, Germany,
6 nm Detection in Height Measurement
Confocal A
Confocal B
Laser Beam
Traditional
Multilayer Mode
Z-Position
Z-Position
Reflected Light
Polyimide Film
Metallic Surface
Repeatability &
Accuracy
Accuracy
Traceability System
The OLS4100 uses a rigorous system of production for
every component. From the objective to the laser head,
Olympus delivers only the highest-quality systems based
on comprehensive inspection to the strictest standards.
On delivery, final adjustment and calibration is performed
by qualified engineers in the actual measurement
environment.
Standard Step
Standard Scale
LEXT OLS 4100
*According to Olympus survey as of Dec 2008.
Area/Volume Measurement
Surface Roughness
Measurement
This mode allows measurement of line
roughness on one line and plane
roughness on the entire surface.
Particle Measurement*
Geometric Measurement
Film Thickness
Measurement*
OLYMPUS Stream*
Workflow Solution for
Improved Image Analysis
Performance
For grain size analysis or
nonmetallic inclusion rating,
optional OLYMPUS Stream microimaging software is available,
which can be uploaded directly
from the OLS4100.
"OLYMPUS Stream"
Launch Button
*Optional unit.
Micro Roughness
Contact surface roughness gauges cannot measure micro surface contours less than the stylus tip diameter. The OLS4100
can measure the surface roughness of micro geometries at high resolution due to a minute laser spot diameter.
Contact Surface
Roughness
Measuring Machine
R: 2 m
LEXT
OLS4100
R: 0.2 m
Non-Contact Measurement
Since a contact surface roughness gauge uses a hard
needle-shaped stylus, it is more likely to scratch the surface
of a soft specimen, damaging or deforming it. With adhesive
specimens, on the other hand, the stylus can attach to the
specimen and be damaged when pulled loose, making it
impossible to obtain correct results. The OLS4100, a noncontact laser microscope, can perform accurate surface
roughness measurement regardless of surface texture
conditions.
Soft Specimen
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Adhesive Specimen
Bonding Wires
Primary Profile
: Pp, Pv, Pz, Pc, Pt, Pa, Pq, Psk, Pku, Psm, Pq, Pmr(c), Pc, Pmr
Roughness Profile
: Rp, Rv, Rz, Rc, Rt, Ra, Rq, Rsk, Rku, Rsm, Rq, Rmr(c),Rc, Rmr, RZJIS, Ra75
Waviness Profile
: Wp, Wv, Wz, Wc, Wt, Wa, Wq, Wsk, Wku, Wsm, Wq, Wmr(c), Wc, Wmr
Motif
Amplitude Parameters
Functional Parameters
Volumetric Parameters
Lateral Parameters
: Sal, Str
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High-Quality Imaging
For clear 3D color images, high-sensitivity laser DIC, or high-dynamic range
(HDR) images.
Real-Color 3D Image
Height Map
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DIC
Differential Interference Contrast (DIC) is an observation method used to visualize nanometer micro surface contours, which
normally lie far beyond the resolving power of a laser microscope. Thanks to its DIC laser mode, the LEXT OLS4100 allows you
to obtain live images comparable to those of an electron microscope, under relatively low power magnifications.
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HDR
The OLS4100's High Dynamic Range (HDR) function combines several optical microscope images captured using different
exposures. Brightness, contrast, texture, and saturation are controlled individually so that HDR creates images with a wide
dynamic range. This enables clear visualization of a color image, especially for samples lacking texture.
Algorithm
Parameter Adjustment
Several Different Exposure Images
Brightness Control
Processed Image
Contrast Control
High Tone Image Processing
Texture Control
Saturation Control
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16
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3D Imaging
Conventional 3D Acquisition
OLS4100 3D Acquisition
Auto Recognition
OLS4100
Conventional Model
Automatic
Control
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Lower Limit
Setting
Brightness
Setting
Upper Limit
Setting
Brightness &
Upper/
Lower Limit
Check
Click on
Acquisition
Button
Auto Lower
Limit Setting
Auto Upper
Limit Setting
Auto
Brightness
Setting
Click on
Acquisition
Button
Acquisition
Acquisition
Fine
1.0
5.5
Fast
9.3
Ultra-Fast
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(images)
1024
X
128
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Measuring
Areas in
Z-Axis
Direction
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One-Click Solutions
Wizard Function
A detailed user-designed wizard function eliminates the need for lengthy training and allows quick and easy operation by
new operators.
Image A
Image B
Image C
Customizable
Recipe
Image D
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400 nm
700 nm
800 nm
Conventional Microscopes
(550 nm peak)
2D Scanning System
For 2D scanning, the OLS4100 incorporates an
Olympus scanner-on-scanner. An electromagnetic
MEMS scanner handles the X direction, while a
high-precision Galvano mirror takes care of
scanning in the Y direction. This innovative system
enables the axis of the scanner and the exit pupil
of the objective to be placed at an optically
conjugate position. This ideal optical layout allows
accurate high-speed, low-distortion X-Y scanning,
enabling the OLS4100 to provide high-density
scanning up to 4096 x 4096 pixels.
Non-Confocal
Confocal
Non-Confocal
Photomultiplier
Photomultiplier
Circular
Confocal
Pinhole
Telan Lens
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Telan Lens
Confocal
CFO Search
Obtaining height information is a primary
function of the OLS4100 and is achieved by
moving the objective upward to detect the
change of light intensity along the Z-axis.
Olympus CFO (calculated focus operation)
technology detects light intensity automatically in
order to obtain discrete height data. The
approximate curve of an ideal I-Z curve is
calculated alongside the maximum brightness
value and Z-axis information, which define each
image pixel. CFO search technology significantly
improves repeatabilityone of the most
indispensable assets of a measurement tool.
Calculated Height
Height
Based on these basic principles, the LEXT OLS4100 offers the following features:
10-nanometer resolution in the
Z-axis direction to enable 3D
surface contour measurement
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Sample Applications
Semiconductor/FPD (Flat Panel Display)
1
1 Wafer Bump
1 Photomask
(objective 20x/optical zoom 1x/scanning area 640 m x 640 m)
Sample provided by Koshibu Precision Co., Ltd. (P3,P24)
2 Micro Lens
(objective 100x/optical zoom 1x/scanning area 128 m x 128 m)
3 Flexible PCB Connector
(objective 50x/optical zoom 1x/scanning area 256 m x 256 m)
4 MEMS
(objective 20x/optical zoom 1.3x /scanning area 483 m x 483 m)
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Material/Metal Processing
1
25
LINEUP
Standard-Type OLS4100-SAF
405
300mm-Stage-Type OLS4100-LAF
276
Unit: mm
550
448
1300
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358
MAIN UNIT
LSM Section
Measurement
Light Source/Detector
Planar Measurement
Height Measurement
Total Magnification
108x 17,280x
Zoom
Optical Zoom: 1x 8x
Repeatability
100x: 3n-1=0.02 m
Accuracy
Measurement Value 2%
System
Stroke
10 mm
Scale Resolution
0.8 nm
Movement Resolution
10 nm
Display Resolution
1 nm
Repeatability
50x: n-1=0.012 m
Accuracy
Light Source/Detector
Zoom
Digital Zoom: 1x 8x
Revolving Nosepiece
Objective
100 mm
XY Stage
This product is designed for use in industrial environments for the EMC performance. Using it in a residential environment may affect other equipment in the environment
OBJECTIVE SPECIFICATIONS
Model
Magnification
Field of View
MPLFLN5X
108x-864x
2,560-320 m
20.0 mm
0.15
MPLFLN10X
216x-1,728x
1,280-160 m
11.0 mm
0.30
MPLAPON20XLEXT
432x-3,456x
640-80 m
1.0 mm
0.60
MPLAPON50XLEXT
1,080x-8,640x
256-32 m
0.35 mm
0.95
MPLAPON100XLEXT
2,160x-17,280x
128-16 m
0.35 mm
0.95
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www.olympus-ims.com
All company and product names are registered trademarks and/or trademarks of their respective owners.
Images on the PC monitors are simulated.
Specifications and appearances are subject to change without any notice or obligation on the part of the manufacturer.
M1775E-072014