3 (2009) 1, ISSN 1846-5900: Dvanced Ngineering
3 (2009) 1, ISSN 1846-5900: Dvanced Ngineering
3 (2009) 1, ISSN 1846-5900: Dvanced Ngineering
Keywords: scanning probe microscope, interference microscope, contact stylus profilometer, nanometrology.
1 INTRODUCTION
Under term nanotechnology we understand creating and using of materials, devices
and systems, structure which contain in nanometer range. Nanometrology is science
and practice for metrological assurance quality of nanotechnology. For measuring
objects of nanotechnology a lot of measuring equipment of geometrical values are
applied. All of them are 2Dimensional and 3Dimensional coordinate measuring
devices of nanometer range. Among them accuracy of measurement geometrical values
till present time not enough assured. For metrological assurance of nanotechnology are
very important the next tasks:
nanometer scale. The results received at measurement on NanoScan topology of a testobjects surface were compared to data, received at research of the same objects on
following AFM.
1) AFM NanoScan, developed and production by HTE Co., Moscow, Russia used
the noncontact mode of scanning (bend cantilever under influence of attractive
forces is supervised). (Fig. 1.)
Fig. 2. P4-SPM-MDT
a) Strip of height 7 nm
b) Strip of height 70 nm
Received results have allowed to make the following conclusions. The test object
as a square grid can be used for determination of the scanning field sizes and
coordinates system nonlinearity in a XY plane. As a whole, the spent researches have
confirmed perspective of similar test-objects application for calibration of various SPM
parameters.
Test-objects
Strip 7 nm
Measured
depth, m
height, nm
0.50.1
71
0.40.1
Square grid
step,
m
40.1
40.1
40.5
0.50.2
81
Strip 70 nm
Measured
height, nm
705
7010
But new modification New View 6200 (Fig. 5.) is a powerful tool for characterizing and quantifying surface roughness step heights critical dimensions and other
topographical features with excellent precision and accuracy.
The new modification of interference microscope MII-4 (Fig. 4.) was developed
for the automatic identification of the achromatic land in white light interferometers
and for the digital measurements of its centre position. It can:
- to automatic the measuring process in white light;
- to control processing of data with a computer;
- to display (or print) graphics and digital information about object under investigation;
- to increase the accuracy and sensitivity of interferometric methods and widen in
the range of measurement both of low and high film thickness.
So, with these interferometers we can measure profiles of the surfaces with high
accuracy.
Fig. 6. Results of measuring artefacts with height 7 nm, 70 nm and 800 nm.
Fig. 7. Talystep
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5 CONCLUSION
1. The investigations of possibilities of precision measurement of 2D and 3D nanostructures by different measuring devices of nanometer range are executed. We determined that investigated measuring devices of nanometer range allow to measure geometrical size both in horizontal plane XY and along vertical axis Z.
2. Since the wavelength of light is used as a standard in interference microscope, (it
is the natural standard), this interferometer can be recommended as a primary standard
for assurance traceability in nanometer range.
3. Investigated and calibrated 2D diffraction greed and multilayer step gauges can
be used as a working standard for traceability in nanometer range.
4. Traceability of measurements in nanotechnology can be achieved by executing
calibration of measuring devices nanometer range according calibrating hierarchy
scheme.
References:
[1]
Received: 2008-12-16
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