Seminar’04 FinFET

INTRODUCTION

Since the fabrication of MOSFET, the minimum channel length has been
shrinking continuously. The motivation behind this decrease has been an increasing interest
in high speed devices and in very large scale integrated circuits. The sustained scaling
of conventional bulk device requires innovations to circumvent the
barriers of fundamental physics constraining the conventional
MOSFET device structure. The limits most often cited are control of the
density and location of dopants providing high I on /I of ratio and finite
subthreshold slope and quantum-mechanical tunneling of carriers
through thin gate from drain to source and from drain to body. The
channel depletion width must scale with the channel length to contain
the of-state leakage I of. This leads to high doping concentration, which
degrade the carrier mobility and causes junction edge leakage due to
tunneling. Furthermore, the dopant profile control, in terms of depth and
steepness, becomes much more difficult. The gate oxide thickness t ox
must also scale with the channel length to maintain gate control, proper
threshold voltage VT and performance. The thinning of the gate dielectric
results in gate tunneling leakage, degrading the circuit performance,
power and noise margin.

Alternative device structures based on silicon-on-insulator

(SOI) technology have emerged as an efective means of extending
MOS scaling beyond bulk limits for mainstream high-performance or low-

Dept. of Electronics & Communication

1 Engg.
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Seminar’04 FinFET

power applications .Partially depleted (PD) SOI was the first SOI
technology introduced for high-performance microprocessor
applications. The ultra-thin-body fully depleted (FD) SOI and the
non-planar FinFET device structures promise to be the potential
“future” technology/device choices.

In these device structures, the short-channel efect is controlled

by geometry, and the of-state leakage is limited by the thin Si film. For
efective suppression of the of-state leakage, the thickness of the Si film
must be less than one quarter of the channel length.
The desired VT is achieved by manipulating the gate work function,
such as the use of midgap material or poly-SiGe. Concurrently, material
enhancements, such as the use of a) high-k gate material and b)
strained Si channel for mobility and current drive improvement, have
been actively pursued.

As scaling approaches multiple physical limits and as new device

structures and materials are introduced, unique and new circuit design
issues continue to be presented. In this article, we review the design
challenges of these emerging technologies with particular emphasis on
the implications and impacts of individual device scaling elements and
unique device structures on the circuit design. We focus on the planar
device structures, from continuous scaling of PD SOI to FD SOI, and new
materials such as strained-Si channel and high-k gate dielectric.

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2 Engg.
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Seminar’04 FinFET

PARTIALLY DEPLETED [PD] SOI

The PD floating-body MOSFET was the first SOI transistor

generically adopted for high-performance applications, primarily due to
device and processing similarities to bulk CMOS device.
The PD SOI device is largely identical to the bulk device, except for
the addition of a buried oxide (“BOX”) layer. The active Si film thickness
is larger than the channel depletion width, thus leaving a quasi-neutral
“floating” body region underneath the channel. The V T of the device is
completely decoupled from the Si film thickness, and the doping profiles
can be tailored for any desired VT .

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Seminar’04 FinFET

The device ofers several advantages for performance/ power

improvement:
1) reduced junction capacitance,
2) lower average threshold due to positive V BS during switching.
3) dynamic loading efects,in which the load device tends to be in
high VT state during
switching
The performance comes at the cost of some design complexity
resulting from the floating body of the device, such as
1) parasitic bipolar efect and
2) hysteretic VT variation.

Parasitic Bipolar Effect

In PDSOI an n-p-n transistor is formed with source and drain as
emitter & collector respectively and body as the base. The topology
typically involves an “of” transistor with the source and drain voltage
set up in the “high” state (hence body voltage at“high”) When the
source is subsequently pulled down, large overdrive is developed across
the body-source junction, causing bipolar current to flow through the
lateral parasitic bipolar transistor.This may result in circuit failure.

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Seminar’04 FinFET

In SRAM bitline structures, the aggregate parasitic

bipolar efect of the unselected cells on the selected bitline disturbs the
read/write operations and limits the number of cells that can be
attached to a bitline pair

Hysteretic VT Variation
The hysteretic VT variation due to long time constants of
various
body charging/discharging mechanisms.
A commonly used gauge for hysteretic V T variation (or
“history efect” as it is known in the SOI community) is the disparity in
the body voltages and delays between the so-called “first switch” and
“second switch” . The “first switch” refers to the case where a circuit
(e.g., inverter) starts in an initial quiescent state with input “low” and
then undergoes an input-rising transition. In this case, the initial dc
equilibrium body potential of the switching nMOSFET is determined
primarily by the balance of the back-to-back drain-to-body and body-to-
source diodes. The “second switch” refers to the case where the circuit
is initially in a quiescent state with input “high.” The input first falls and
then rises (hence, the name “second switch”). For this case, the
preswitch body voltage is determined by capacitive coupling between
the drain and the body.
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Seminar’04 FinFET

Input/output waveforms&nMOS body voltage for a PD SOI CMOS inverter under “first switch” & “second
switch” condition is shown above
The duty cycle, slew rate, and output load also afect the
hysteretic behavior of the circuits. A higher duty cycle increases
hysteretic behavior due to higher switching activity causing a gain or
loss of body charge and less time for the
device to return/settle to its initial equilibrium state

SCALING Si FILM: FROM PD SOI TO FD SOI

The major benefits of scaling/thinning of the Si film are: 1)

reduction of junction capacitance for performance improvement, 2)
better short channel roll-of, and 3) better soft error rate (SER) due to
less charge generation and collection volume.

In addition, the history efect (disparity between first switch and

second switch) is also reduced. The reduced junction capacitance
improves delays of both the first and second switches. However, for the
second switch the reduced junction capacitance reduces the capacitive
coupling between the drain and the body .The resulting decrease in the
pre-switch body voltage for the second switch partially ofsets the
performance improvement.

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Seminar’04 FinFET

Unfortunately, the thinning of Si film degrades the body

resistance, rendering body contacts less efective and eventually useless
.Self-heating becomes more severe. Furthermore, as the film thickness is
scaled below 50nm,the device may become dynamically fully depleted
(or quasi-depleted);the body would become fully depleted under certain
bias conditions or during certain circuit-switching transients. This
necessitates a unified PD|FD device model with smooth and seamless
transitions among diferent modes of operation. Typically, this is
modeled by varying the built-in potential between the body and source
junction, thus changing the amount of body charges the body-to-source
junction diode can sink for a given change in the body potential .The
presence of dynamic full depletion also complicates the static timing
methodology. The various body voltage bounds, established based on
the assumption of partial depletion need to be extended to cover this
new phenomenon. Notice that dynamic depletion tends to occur first in
long-channel, low VT devices. For short channel devices, the proximity
of the heavily doped “halo” regions to each other increases the efective
body doping, and the device is less likely to be dynamically fully
depleted. In a FD_SOI device, the channel depletion layer extends
through the entire Si film. This significantly reduces the floating body
efect (completely eliminating the floating-body efect with ultra-thin Si
films). A raised source/drain structure is typically employed to overcome
the large source/drain series resistance of the thin Si film. There are two
approaches to achieve the desired VT. One can use the traditional dual
P+/N+ poly-silicon with a highly doped channel. This approach has
several drawbacks and limitations: a) VT would be sensitive to Si film
thickness variation, b) high doping degrades the carrier mobility and
results in junction edge leakage due to tunneling, and c) in devices with
ultra-thin body, the amount of dopant required for the desired V T can not

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 Seminar’04 FinFET

be realistically achieved. Excessively high body doping would turn the

device into a “resistor” rather than a “transistor.” Consequently, the
preferred and more scalable approach is to build an “undoped” channel
with the desired VT set either by the source/drain halo or by the use of
midgap gate materials. The use of undoped channel a) reduces the V T
sensitivity to Si film thickness variation, b) reduces dopant fluctuation effect, c)
reduces transverse electric field and impurity scattering, leading to higher
mobility, and d) reduces band-to-band tunneling leakage at the junction
edge.

The use of midgap gate materials may allow the use of a single
electrode for both nMOSFETs and pMOSFETs.

As the Si film thickness is reduced, the gate has more control of

the channel charges, and the subthreshold slope improves. The channel
leakage in the device is limited by the Si film thickness and decreases as
the film thickness is reduced. The fringing electric field from source/drain
penetrates into the buried oxide underneath the channel, which causes
back interface virtual biasing, resulting in increased I of and degraded
subthreshold slope. This can be suppressed by thinning the buried oxide
at the expense of larger junction capacitance to the substrate. The FD SOI
technology is , in general, quite “transparent” for design migration and
the challenge is primarily in technology development and manufacturing.

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 Seminar’04 FinFET

MAJOR DESIGN ISSUES

Gate Oxide Tunneling Leakage
As the gate oxide thickness is scaled to maintain gate control V T
and performance,
gate insulator direct tunneling leakage increases. Nitrided oxide, which
reduces the leakage by any order of magnitude , has been widely used in
the industry to contain this leakage. Nevertheless, the oxide tunneling
leakage increases by 2 5* for every 0.1 nm decrease in oxide thickness.
This amounts to over a 30* increase per technology generation. On the
contrary, the channel leakage increases by about 3-5 per technology
generation. As such , the oxide tunneling leakage has quickly approached
Iof and will surpass Iof at room temperature for oxide thickness around
1.0nm or below , thus becoming a serious concern for overall chip
leakage.
Furthermore, at 1.0nm, the tunneling leaking for nitrided oxide
reaches 100A/cm2,
while the traditional reliability limitation for silicon dioxide gate insulator
leakage is 1.0A/cm2 .A recent study showed that, at 100 A/cm 2 , static
CMOS and domino circuits in bulk CMOS still exhibit “acceptable
functionality and noise margin”.
The oxide tunneling current consists of several components. The electron tunn
from the valence band (EVB) generates the substrate current in both
nMOS and pMOS .This substrate current component is significantly less
than the tunneling current between the gate and the channel, and its
efect can usually be neglected in bulk CMOS .In PD SOI devices, however,
this substrate current charges or discharges the body, thus changing V T
and afecting circuit operation. As this gate-to-body tunneling current has
a weaker temperature dependence than the channel current, and other

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 Seminar’04 FinFET

leakage and body charging/discharging current components, its efect is

more pronounced at lower temperature.
The detailed study on a 34-kb L1 directory SRAM showed that the presence of in
the gate-to-body tunneling current resulted in much more significant degradation “write”
operation compared with the “read” operation. On the other hand , the initial cycle parasitic
bipolar disturb resulting from the aggregate efect of unselected cells in
the same bitline was reduced.
The gate-to-body tunneling current increases the disparity
between the first switch and the second switch.
In FD SOI and FinFET with ultra-thin body, the gate tunneling
leakage is significantly reduced. This is because 1) in these, an undoped or very lightly
doped body (channel) is used and the depletion charges essentially equal to
zero, thus reducing the vertical electric field in the channel, and 2) the
quantum confinement efect in ultra-thin Si film results in a broader
inversion charge distribution and lower vertical electric field at the
bottom of the inversion layer. Consequently, the gate tunneling leakage is
reduced by about 3-4X.If a high-k gate dielectric such as HfO 2 ,the
reduction in gate current can exceed an order of magnitude as the
increased physical thickness of the gate dielectric barrier makes the
tunneling current more dependent upon the shape
of the potential well in Si. In general, scaling of the body thickness
reduces the gate leakage current because the potential well becomes
shallower. However, excessive scaling\thinning of body thickness
below~5nm increases confinement of carriers toward the gate dielectric
interface, and the gate current increases to approach that of the bulk
devices. This may not be of concern since 5nm is close to the practical
limit of body thickness in actual device technologies.

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Seminar’04 FinFET

Self heating
The heat transfer is dominated by phonon transport in
semiconductors and by electron transport in metals. The thermal
conductivity of the buried oxide (1.4 W/m-.C) is about two orders of
magnitude lower than that of Si (120 W/m-.C), giving rise to local self-
heating in SOI devices. This is particularly a concern for devices that are
“on” most or all the time (e.g., biasing elements, current source, current
mirror, bleeder, etc.) and for circuits with high duty cycle and slow slew
rate (such as clock distribution, I/O driver).
Scaling of the Si film degrades the thermal conductivity and
increases the thermal resistance. In scaled SOI devices, both the
channel length and Si film thickness are much smaller than the phonon
mean free path for Si (~300 nm at room temperature), and the thermal
conductivity is severely degraded due to phonon boundary scattering.
The thermal resistance increase is particularly significant for
thinner Si film with thick buried oxide. As the Si film thickness is scaled
further to approach the Phonon wavelength (~ tens of nm), the phonon
confinement efect becomes significant. This is the mechanical/thermal
analogy of the quantum confinement efect in electronic devices with an
ultra-thin Si film. The boundary conditions change from the usual
periodic boundary conditions for bulk materials to essentially zero
displacements on the boundaries in SOI.
Soft Error Rate
The α-generated charges in SOI devices are substantially less
than in bulk devices due to the presence of the buried oxide, and
appreciable charge generation can only occur when an α-particle hits
the channel region. While scaling of the device reduces the charge
generation volume, the Qcrit also decreases due to a lower capacitance at
the cell’s storage node and scaled VDD.

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Seminar’04 FinFET

In a PD SOI device, the total charges accumulated at the cell

storage node can be significantly higher than the α-generated charges
due to the parasitic bipolar efect. For properly scaled PD SOI devices,
the parasitic bipolar gain is reduced, and the resulting overall single-
event-upset-induced failure rate is less than that of bulk silicon.
Furthermore, scaling/thinning of the Si film reduces the charge
generation volume and the base-emitter (body-source) junction area of
the parasitic bipolar transistor, thus improving SER as well.
Strained-Si channel And High-k Gate
Strained-Si surface channel CMOS has recently emerged as
an efective means of extending scaling for future high-performance
applications due to higher mobility and improved I on. The lattice
mismatch between the Si channel and the underlying relaxed SiGe layer
results in biaxial tensile strain, which reduces the intervalley scattering
by increasing sub-band splitting and enhances carrier transport by
reducing conductivity efective mass.
Combining strained si-channel and SOI complements the
improved Ion of strained Si channel device with the benefit of SOI.
However, there are numerous design implications. The narrower
bandgap of the SiGe layer causes a heterostructural band ofset, which
reduces VT and increases Iof. The mobility enhancement for nMOS and
pMOS may be quite diferent due to device design and process
integration constraints, which may upset the established β(p/n strength)
ratio of existing designs. The tensile strain is “biaxial”, so mobility
enhancements (therefore Ion improvement) are the same along X- and Y-
axis. However, in some high-density design (eg: SRAM cell), “bent gates”
at a 45° angle are sometimes used, which would result in disparity in
mobility enhancement and Ion improvement. The SiGe layer with 20% Ge
has a 70% higher dielectric constant and a 10% lower built-in potential

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Seminar’04 FinFET

due the narrower band gap, resulting in higher junction capacitance.

Furthermore, higher body doping density could be needed to
compensate for the VT reduction which further increases the junction
capacitance. The thermal conductivity of the SiGe layer is about 15X
lower than that for Si thus aggravating the self-heating efect.
The presence of the SiGe layer also significantly afects the
floating-body efect. For 20% Ge content, the band gap is about 90% of
that of Si. This narrower bandgap results in higher (~10X) intrinsic
carrier density ni , and thus proportionally higher recombination current
at the body-to-source junction. The narrower bandgap and higher
dielectric constant of the SiGe layer, and the higher body doping to
compensate for the lowered V T caused by the band ofset, give rise to
larger band-to-band tunneling current and trapped-assisted tunneling
current at the drain-to-body junction. The latter efect may overpower
the increase in recombination current at the body-to-source-junction,
resulting in more significant floating-body efect.
High-k gate dielectric has recently been pursued to contain the
gate leakage and extend device scaling. Most of the potential high-k
gate insulators have lower bandgap than SiO 2 and therefore must be
thicker to keep the tunneling leakage down. These materials also have
charge-trapping related VT instability and mobile degradation. The
integration of high-k gate dielectric with strained-Si channel significantly
enhances the mobility. Notice that, as the high-k gate material ofers
higher gate capacitance per unit area, some circuit resizing/retuning
may be necessary, especially in the critical paths where device
capacitances tend to dominate.

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Seminar’04 FinFET

INTRODUCTION TO DOUBLE_GATE CMOS

Innovative device architectures will be necessary to continue
the benefits that previously acquired through rote scaling. Double-gate
CMOS (DGCMOS) ofers distinct advantages for scaling to very short
gate lengths. Furthermore, adoption of gate dielectrics with permittivity
substantially greater than that of SiO 2 (so-called “high-k materials”) may
be deferred if a DGCMOS architecture is employed. Previously, serious
structural challenges have made adoption of DGCMOS architecture
untenable. Recently, through use of the delta device, now commonly
referred to as the FinFET, significant advances in DGCMOS device
technology and performance have been demonstrated. Fabrication in
FinFET-DGCMOS is very close to that of conventional CMOS process, with
only minor disruptions, ofering the potential for a rapid deployment to
manufacturing. Planar product designs have been converted to FinFET–
DGCMOS without disruption to the physical area,
thereby demonstrating its compatibility with today’s planar CMOS design
methodology and automation techniques.

Overcoming Obstacles By Doubling Up

CMOS technology scaling has traversed many anticipated
barriers over the past 20 years to rapidly progress from 2µm to 90 nm
rules. Currently, two obstacles, namely subthreshold and gate-dielectric
leakages, have become the dominant barrier for further CMOS scaling,
even for highly leakage-tolerant application such as microprocessors.

DOUBLE GATE FET

Double-gate CMOS (DGCMOS) offers distinct advantages for scaling to very short
gate lengths. Fabrication of FinFET-DGCMOS is very close to that of conventional CMOS

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Seminar’04 FinFET

process, with only minor disruptions, offering the potential for a rapid deployment to
manufacturing. Planar product designs have been converted to FinFET-DGCMOS without
disruption to the physical area, thereby demonstrating its compatibility with today’s planar
CMOS design methodology and automation techniques.
Overcoming Obstacles By Doubling Up
CMOS technology scaling has traversed many anticipated barriers over the past 20
years to rapidly progress from 2 µm to 90nm rules. Currently, two obstacles, namely
subthreshold and gate-dielectric leakages, have become the dominant barrier for further
CMOS scaling, even for highly leakage-tolerant applications such as microprocessors.
Double-gate (DG) FETs, in which a second gate is added opposite the traditional
(first) gate, have better control over short-channel effects [SCEs]. SCE limits the
minimum channel length at which an FET is electrically well behaved.

Figure schematically illustrates the advantage of DG-FETs.

As the channel length of an FET is reduced, the drain potential
begins to strongly influence the channel potential, leading to an inability
to shut of the channel current with the gate. This short-channel efect is
mitigated by use of thin gate oxide (to increase the influence of the gate
on the channel) and thin depletion depth below the channel to the
substrate, to shield the channel from the drain. Gate oxide thickness has
been reduced to the point where, at 90 nm CMOS, the power drain from
gate leakage is comparable to the power used for switching of circuits.

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Seminar’04 FinFET

Thus, further reduction of the thickness would lead to unreasonable

power increases.
Alternatively, further decrease of the depletion region X D degrades
gate influence on the channel and leads to a slower turn on of the
channel region.
In DG-FETs, the longitudinal electric field generated by the drain is
better screened from the source end of the channel due to proximity to
the channel of the second gate, resulting in reduced short-channel
efects, in particular, reduced drain induced- barrier lowering (DIBL) and
improved subthreshold swing (S). Therefore, as CMOS scaling becomes
limited by leakage currents, DGCMOS ofers the opportunity to proceed
beyond the performance of single-gate (SG) bulk-silicon or PDSOI CMOS.
Both the DIBL and subthreshold swing for the DG device are dramatically
improved relative to those of the bulk-silicon counterpart. From a bulk-
silicon device design perspective, increased body doping concentration
could be employed to reduce DIBL; however, at some point it would also
increase the subthreshold swing, thereby requiring higher threshold
voltage VT to keep the subthreshold current adequately low. Similarly,
decreasing the body doping concentration could improve the
subthreshold swing but degrade DIBL. Hence a compromise is necessary
for the bulk-silicon device design. Note that, for a scaled bulk-silicon (or
PD SOI ) device, a highly doped channel/halo must be used to control
severe SCEs, and lower S for extremely short L ef could not be achieved
by use of low channel/halo doping.

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Seminar’04 FinFET

In Figure, simulations of the IDS–VGS characteristics of DG and SG

FETs shows the steeper turn on of the DG-FET, which results from the
gate coupling advantage. This property enables the use of lower
threshold voltage for the DG-FET for a given of-current. As a direct
result, higher drive currents at lower power-supply voltages V DD are
attainable.

Double_Gate Threshold Voltage

The very thin silicon body associated with fully depleted DG-FETs
suggests that the centering of V T could be a challenging proposition.
Three basic techniques have been explored both theoretically and
experimentally, namely, use of body doping, use of asymmetric gate
work function, and use of symmetric mid-gap work-function gate-
electrodes.
Adequate body doping can be achieved by directly doping the
silicon body or by use of “halo” (also known as “pocket”) ion implants
introduced laterally from the gate edges, or a combination of these two
techniques. One technique uniquely available to DG-FETs is the use of
asymmetric gates, wherein the two gate electrodes are of materials of
difering work functions.

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 Seminar’04 FinFET

Body doping has been the technique of choice for V T centering

in both bulk and PD-SOI planar CMOS technologies. Adequate body
doping can be achieved by directly doping the silicon body or by use of
“halo” ion implants introduced laterally from the gate edges, or a
combination of these two techniques.
Metal gates ofer the possibility of centering threshold voltage
with asingle work function for both gate electrodes without relying on
body doping. Many metals with workfunctions near the middle of the
silicon bandgap exist. Use of these metals in SG-FETs is problematic
since the VT of such devices is typically above 0.5 V , which is too high
for most CMOS applications. Lower VT may be achieved by counter-
doping the
body, which results in buried conduction channels in the of-state, thus
degrading short channel efects. Metal gates on DG-FETs, on the other
hand, naturally achieve the VTs in the vicinity of 0.2 V(the exact value
depending on the details) and good short channel characteristics.

DOUBLE-GATE TAXONOMY
Numerous structures for DG-FETs have been proposed and
demonstrated. These structures may be classified into one of the three
basic categories.
Type I, The Planar DG-FET:
This is a direct extension of a planar CMOS process with a
second, buried gate

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Seminar’04 FinFET

Type II, The Vertical DGFET:

Here bthe silicon body has been rotated to a vertical
orientation on the silicon wafer with the source and drain on the top and
bottom boundaries of the body, and the gates on either side.

Type III Non Planar FinFET:

In FinFET the silicon body has been rotated on its edge into
a vertical orientation so only the source and drain regions are placed
horizontally about the body, as in a conventional planar FET. Referred to
as FinFETs as the silicon resembles the dorsal fin of a fish.

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 Seminar’04 FinFET

THE DOUBLE-GATE CHALLENGE

DG-FETs have been the subject of much research for over 20 years; hence, if
DGCMOS offers significant advantage over SG devices, one must question why DG devices
have not played a significant role on the CMOS technology scene to date.
The four major obstacles to DGCMOS are represented
schematically.

The first three issues are closely related to one another and consist of
1. definition of both gates to the same image size accurately

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2. self-alignment of the source/drain regions to both top and bottom

gates
3. alignment of the two gates to one another.
These three goals are critical for short devices to
provide high drive current and low gate capacitance
simultaneously.
4. The fourth obstacle is that of providing an area-efficient means of
connecting the two gates with a low-resistance path

Type I planar DG-FETs are severely challenged to deliver all of the

first three requirements since the “second” gate is buried below a layer
of active silicon. The fourth hurdle also challenges the planar DG-FET; a
process module is required to define the additional contact to the buried
gate if space is not to be lost to it, and a low-resistance gate material
must be introduced in the buried oxide.

Type II vertical DG-FETs typically address problems 1 and 4 quite

successfully. In this case the gate length is usually defined by the
thickness of a deposited gate-electrode material, which automatically
makes both gates the same length and self-aligned to each other.
Similarly, the source and drain junctions can be symmetrically defined to
have the same alignment to both gates; however, unique challenges are
presented to defining both self-alignment of the bottom junction to the
gates and to keeping the parasitic series resistances associated with the
bottom junction low. Furthermore, a space-efficient low-capacitance
contact scheme to the lower junction requires a high-wire act in process
integration. While high drive currents have been achieved with Type II

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Seminar’04 FinFET

structures, high performance (e.g., low capacitance) and CMOS

integration have met with limited progress.

Type III vertical fin-type DG-FETs have the advantages access to both gates, and
both sides of source and drain, from the front of the wafer. Gate length is conventionally
defined since the direction of the current is in the wafer plane. Gate width, however, is no
longer controlled by lithography; rather, the width is given by twice the height of the
silicon fin HFin .

Finfet

FEATURES OF FINFET

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Finfet consists of a vertical Si fin controlled by self_aligned double gate.

Main Features of Finfet are

1) Ultra thin Si fin for suppression of short channel effects

2) Raised source/drain to reduce parasitic resistance and improve currrent drive
3) Gate_last process with low_T,high_k gate dielectrics
4) Symmetric gates yield great performance,but can built asymmetric gates that target
VT

Finfets are designed to use multiple fins to achieve larger channel

widths.Source/Drain pads connect the fins in parallel. As the number of fins is increased
,the current through the device increases.For eg: A 5 fin device 5 times more current than
single fin device.

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Seminar’04 FinFET

Schematic explaining the parts of a FinFET

PROCESS FLOW OF FINFET

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Seminar’04 FinFET

FinFET-DGCMOS Process Flow in Detail

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Seminar’04 FinFET

A conventional SOI wafer can be used as starting material, except that the
alignment notch of the wafer is preferably rotated 45° about the axis of symmetry of the
wafer. The reason for this deviation is to provide{100} planes on silicon fins that are
oriented along the conventional “x” and “y” directions on the wafer.
The process of defining fins and source/drain silicon is very similar to that used to
define trench isolation in today’s CMOS. Patterns are defined and etched into the active top
silicon layer in both processes. The conventional process requires additional processing to
fill and planarize the isolation trenches; the FinFET process, on the other hand, proceeds
directly to channel processing, such as sacrificial oxidations, masked ion implantations for
channels, or specialized passive elements, followed by the gate dielectric module.
Gate deposition and etch are very similar, with less-severe demands on the
selectivity of the gate-electrode etch to gate oxide, since the oxide surface is orthogonal to
the etch direction. Ion implantation of source/drain species and halos( or pockets) must
differ for obvious geometrical reason but otherwise are largely similar to conventional
planar implantation steps. Conventional CoSi2 or NiSi2 processes are used to silicide the
tops of the mesas and the gate, for contacts to source/drain and gate, respectively.
How To Convert Planar To FinFET Technology
As described above, FinFET processing on SOI wafers uses standard
manufacturing process modules. To etch the ultra thin (TSI=15nm) fins, spacer lithography
[side wall image transfer] is used. Since the SIT process always generates an even number
of fins, an extra process step is needed for removal of fins to allow odd number of fins or
otherwise break fin” “loops” where needed. This means, that for conversion of an existing
design, two additional levels have to be introduced, namely the “ fin” and the “Trim” level.
All other design levels remain the same.
Consider now a planar design to be converted for processing in the 90 nm
FinFET technology node. The FinFET height HFin together with the fin pitch (determined
by photolithography) defines the FinFET device width WFin within the given silicon width
of the planar device, to get the same or better device strength . For automatic Fin and Trim
generation, Fin-GEN, a software tool, has been developed, which takes the active area and
poly gate levels, and, based on special FinFET ground rules, generates the additional

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levels.the circuit (as well as other β-ratio sensitive circuitry) may additionally require
manual adjustment on the number of fins in the N- and P-devices after automatic addition
of fins in the N- and P- devices after automatic addition of the FinFET levels.

Besides device width quantization, other factors like width variation, threshold
variation, and self-heating must be taken into account when designing with FinFETs. A
process with multiple threshold voltages and multiple gate oxide thickness is required to
take full advantage of this new device.

As already discussed, the width quantization imposes some restrictions on the

device strength flexibility, but most of them can be absorbed easily when converting an
existing design or starting a new design, respectively. Of course, as stated earlier, latches,
dynamic circuit styles in general, and SRAM cells need careful optimization when
designing with FinFETs.

Discrete devices and circuits for analog applications require special attention. As an
example, consider a driver/receiver circuit with an ESD protection diode. In a planar
process the protection voltage is proportional junction length of the diode. In FinFET
technology the same junction length per fin pitch may be only about one-eigth of that of the
planar device.

Another example is the total output driver impedance matching, which is usually
implemented with a planar resistor requiring a silicon block resistor, on a silicon island to
adjust output impedance (including the wire to the pad) to 50 Ω. For such applications, and
analog circuits in general, special devices may be necessary for optimized designs using
FinFETs.

APPLICATIONS OF FinFETs

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DG devices like Fin FETs offer unique opportunities for microprocessor

design.compared to a planar process in the same technology node, FinFETs have reduced
channel and gate leakage currents. This can lead to considerable power reductions when
converting a planar design to fin FET technology. Utilizing fin FETs would lead to a
reduction in total power by a factor of two, without compromising performance.
Another possibility to save power arises when both gates can be controlled
separately. The second gate can be used to control the threshold voltage of the device,
thereby allowing fast switching on one side and reduced leakage currents when circuits are
idle.
Finally, separate access to both gates could also be used to design simplified logic
gates. This would also reduce power, and save chip area, leading to smaller, more cost-
efficient designs. However chip designs using finFETs must cope with quantization of
device width, since every single transistor consists of an integral number of fins,each fin
having the same height.

SIMULATION OF VERTICAL DOUBLE-GATE SOI

MOSFETS USING DEVICE3D

Introduction

This article will present the simulation methodology of a self-aligned double-gate

MOSFET structure (FinFET) using SILVACO 3-D simulation suite. The double-gate
MOSFET is one of the most attractive alternative to classical MOSFET structure for gate
length down to 20nm. The main advantage of the FinFET is the ability to drastically reduce
the short channel effect. In spite of his double-gate structure, the FinFET is closed to its
root, the conventional MOSFET in layout and fabrication. 3-D numerical simulations of the
FinFET are performed in this article, in order to validate the basic principles and to uncover
several important aspects: evaluation of the length , width and quantum effects.

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Device Features
The features of the structure are shown in Figure 1 are: (1) a transistor is formed in
a vertical ultra –thin Si fin and is controlled by a double-gate, which considerably reduced
short channel effects; (2) the two gates are self aligned and are aligned to S/D; (3) S/D is
raised to reduce the access resistance; (4) Up to date gate process: low temperature, high -k
dielectrics can be used and (5) the structure is quasi-planar because Si Fin is relatively short
[1,2].
Device Simulation
The 3-D SILVACO simulation suite including Device3D, DevEdit3D and
TonyPlot3D, allows device engineers to study deep sub-micron devices which are 3-D by
nature like the FinFET presented above. Furthermore, 3-D simulations give access to data
impossible to measure like charge distribution, potential, electric field and current lines.
A 3-D FinFET structure was designed by using DevEdit3D. This is an advanced
tool for structure editing and mesh generation. The device structure was realized by
drawing first the FinFET, from the bottom view (Figure 2),in a (x,y) plane before extending
it in the z-direction.

Figure 1: Illustration of DEVEDIT3D used to build the FinFET structure

The z-direction in this case corresponds to the vertical to the substrate. The final 3-
D structure is shown in TonyPlot3D (Figure 3).

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Figure 2: Plot of a 50-nm FinFET 3-D structure for a width of 50nm

The basic characteristics of this FinFET was Tox=2nm length=50nm width=50nm

and Fin height=50nm. Note that we have defined a parameterized structure for subsequent
use in our automation tool, which make much more easier any kind of variation (length,
width) to perform large scale simulation.

The main physical effects (mobility, carrier statistics, recombination) were

expressed by a set of models universally used for simulating the MOS technology: mobility
dependence of the electric field and doping level, Boltzmann statistics and Schokley-Read-
Hall generation recombination mechanisms [3].

Simulation Results

Typical I-V characteristics of a 50-nm gate length are shown in Figure 4. The
leakage current caused by DIBL was well suppressed.

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Figure 3: 50-nm FinFET IdVg curves for a width of 50nm.

The roll-off of a FinFET with a width of 50nm is well controlled as can be seen in
Figure 5. This result can be correlated to the good control of the channel potential due to
the double gate.

Figure 4: Threshold voltage as a function of gate length for a width of 50-nm.

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The width of this FinFET is adjusted by the number of Si fins. Let say you want to
double the width of your device then you have to put 2 Fins between source and drain
(Figure 6).

Figure 5: Structure of a 2-parallel channel device. Gate length 50-nm.

Note that this can be achieved very simply using the "mirror" feature in DevEdit3D.
The resulting I-V curve can be seen

Figure 6: Drain current comparison between single and

2-parallel channel device. Gate length 50-nm.

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Finally we have made simulations using our quantum module named Quantum3D.
The result is plotted in Figure 8. One can see a shift in the threshold voltage indicating
some quantum effect. This correction is quite small as indicated in [2].

Figure 7: Quantum effect in a 50-nm with a width of 50nm.

Sub 50-nm FinFETs were successfully simulated using 3-D SILVACO simulation
tools. It is very easy to study the impact of the geometry and doping of this 3-D device
using Device3D. Indeed more and more people take a look at this novel structure since it is
an attractive successor to the single-gate MOSFET.

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33 Engg.
GEC, Thrissur
Seminar’04 FinFET

CONCLUSIONS

Simulations show that this structure should be scalable down to 10 nm. Formation
of ultra thin fin (0.7 Lg, for a lightly doped body) is critical for suppressing short channel
effects. This structure was fabricated by forming the S\D before the gate, a technique that
may be needed for future high-k dielectric and metal-gate technologies that cannot tolerate
the high temperatures required for S\D formation. Further performance improvement is
possible by using a thinner gate dielectric and thinner spacers. Despite its double gate
structure, the FinFET is similar to the conventional MOSFET with regard to layout and
fabrication. It is an attractive successor to the single gate MOSFET by virtue of its superior
electrostatic properties and comparative ease of manufacturability. Industrial research
groups such as Intel, IBM and AMD have shown interests in developing similar devices, as
well as mechanisms to migrate mask layouts from Bulk-MOS to FinFETs. Issues such as
gate work function engineering, high quality ultra thin fin lithography and source\drain
resistance need to be resolved and a high-yield process flow needs to be established by
process researchers before FinFETs can be used in commercial ICs. Device researchers
need to understand and model quantum effects, and circuit design researchers need to
exploit the packing density afforded by the quasi-planar device to design efficient
architectures.

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REFERENCES:

1. S. Thompson, P. Packan and M. Bohr, “MOS scaling , Transistor challenges for the
21st century,” Intel Tech.J.,vol.Q3, pp1-19,1998
2. C.H.Wann, H. Noda, T. Tanaka, M.Yoshida and C. Hu, “A comparative study of
advanced MOSFET concepts ,” IEEE Trans. Electron Devices, vol. 43, no. 10, pp
1742-1753, Oct. 1996
3. D.Hisamoto, W.C. Lee, J.Keidzerski, H.Takeuchi, K.Asano, C.Kuo, T.J.King,
J.Bokor and C.Hu, “A folded channel MOSFET for deep-sub-tenth micron era,”in
IEDM Tech. Dig. 1998, pp 1032-1034
4. D.Hisamoto, W.C. Lee, J.Keidzerski, H.Takeuchi, K.Asano, C.Kuo. T.J.King,
J.Bokor and C.Hu, “FinFET-a self-aligned double-gate MOSFET scalable beyond
20 nm,” IEEE Trans.Electron Devices, vol.47, pp. 2320-2325, Dec. 2000.
5. X. Huang, W.C. Lee, C.Kuo, D.Hisamoto, L. Chang, J. Keidzerski, E.
Anderson, H.Takeuchi, Y.K. Choi, K.Asano, V.Subramanian, T.J.King,
J.Bokor, C.Hu, “ Sub-50 nm FinFET: PMOS,” in IEDM Tech.
Dig.1999.,pp 67-70
6. H.S. Wong, K. Chan and Y.Taur, “Self-aligned ( top and bottom)
double-gate MOSFET with a 25 nm thick silicon channel,” in IEDM
Tech.,Dig.1997,pp. 427-430
7. J. Hergenrother et al, “ The vertical replacement-gate (VRG)
MOSFET: A 50 nm vertical MOSFET with lithography-independent
gate length,” in IEDM Tech. Dig. 1999 , pp. 75-78

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CONTENTS

INTRODUCTION 1

PARTIALLY DEPLETED SOI 3

PARASITIC BIPOLAR EFFECT 4

HYSTERETIC VT VARIATION 4

SCALING FROM PD SOI TO FD SOI 5

MAJOR DESIGN ISSUES 7

DOUBLE GATE FET 12

DOUBLE GATE TAXONOMY 15

THE DOUBLE GATE CHALLENGE 17

FEATURES OF FINFET 19

PROCESS FLOW OF FINFET 21

APPLICATIONS OF FINFET 24

SIMULATION RESULTS 24

CONCLUSION 30

REFERENCES 31

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ACKNOWLEDGEMENT

First, and foremost I thank God Almighty for making this venture a success.

I extend my sincere gratitude to Prof. N. Premachandran, Principal, Govt.

Engineering College, Thrissur and Prof. K. P. Indiradevi, Head of Electronics &

Communication Department, Govt. Engineering College, Thrissur for providing me with

necessary infrastructure.

I would like to convey a deep sense of gratitude to the seminar coordinator

Mrs. C. R. Muneera for the timely advices.

I also extend my sincere thanks to my friends and seniors for their help.

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ABSTRACT

The introduction of FinFET Technology has opened new chapters in Nano-

technology. Simulations show that FinFET structure should be scalable down to 10 nm.
Formation of ultra thin fin enables suppressed short channel effects. It is an attractive
successor to the single gate MOSFET by virtue of its superior electrostatic properties and
comparative ease of manufacturability.

Dept. of Electronics & Communication

38 Engg.
GEC, Thrissur