GaN Power Device Tutorial Part2 GaN Driving
GaN Power Device Tutorial Part2 GaN Driving
GaN Power Device Tutorial Part2 GaN Driving
Caused by Caused by Id
Id overshoot undershoot
Non-linearity of COSS
Qgs2+Qgd Qgs2+Qgd
Turn-on-Loss Turn-off-Loss
No Miller
Plateau
Coss Discharge
Non-linear Coss
GaN Chip
Bonding-wire
Inductance
~0.5 nH
Lead Inductance
~10 nH
Power Loop
DFN8x8
VDD
PMW
Gate Driver
Input
Drive Loop
?
GND
Ø Gate resistance Rg
Ø ….
Rg↑:
Ø dv/dt ↓
Ø di/dt ↓
Ø Reduces switching speed
Ø Increase switching loss
ü Rg limits the gate charging and discharging current and reduces dv/dt and di/dt slew rate
ü A properly selected Rg can mitigate the EMI issue that stems from high switching speed
Source: X. Huang, T. Liu, B. Li, F. C. Lee, and Q. Li, "Evaluation and applications of
600V/650V enhancement-mode GaN devices," 2015 WiPDA
4(𝐿# + 𝐿) )
𝑅# ≥
𝐶#)
http://www.electronicdesign.com/power/take-practical-path-toward-high-performance-power-conversion
Ø To avoid ringing, with certain LG, LS and CGS, RG can be calculated as:
http://www.electronicdesign.com/power/take-practical-path-toward-high-performance-power-conversion
Ø dv/dt -
Ø di/dt ↓
Ø CGS mostly affects the
current rising and
falling period
CGD ↑:
Ø dv/dt ↓
Ø di/dt -
Ø CGD mostly affects the
drain rising and falling
period during the
Miller plateau
Alex Lidow Johan Strydom Michael de Rooij David Reusch, GaN TRANSISTORS FOR EFFICIENT POWER CONVERSION, Wiley
CBD
VBC = VDC
CBC + CBD
CBC + CBD
VDC,IJK ≤ VFG
CBD
dVDC
CBD R ≤ VFG
dt B,O
dVDC VFG
⟹ Y ≤
dt IJK CBD Z R B,O
dVDC
CBD (R B,O +R B`Fa + R bc) ≤ VFG
dt
dVDC VFG
⟹ Y ≤
dt IJK CBD Z (R B,O +R B`Fa + R bc)
For example:CBD = CPQQ = 4 pF; CBC = CSQQ − CPQQ = 123 − 4 = 119 pF; R B,O = 1.5 Ω; with
gate driver from TI UCC27611: R bc = 0.35 Ω; and assume R B`Fa = 0.5 Ω and @VDS=400V
Low impedance turn-off drive-loop is critical for designs with GaN due to high dv/dt,
especially for 650V devices
© Fred Yue Fu (傅玥), GaNPower International Inc. 24
GaN device dv/dt issue: A more comprehensive approach
A more comprehensive analysis was done by a group of researchers at Virginia Tech
for MOSFET before, and it can be applied to GaN as well
dVDC VFG
Y ≤
dt IJK 1 RfdQ
Cde R dQ + Cde ( − ) (Le + LQ )(Cde + CeQ )
CdQ 4Ld
Yuming Bai, Deva Pattanayak*, Alex Q. Huang, Analysis of dv/dt Induced Spurious Turn-on of MOSFET, Virginia Tech
Ø GaN has much higher dv/dt and di/dt than SJ MOS, special designs are
necessary and drivers with high CMTI (Common mode transient immunity) is
necessary
Wei Zhang, A Deep Dive of Isolated Gate Driver Robustness – dv/dt (CMTI) and di/dt, TI, APEC 2018
p During device turn-off, this voltage increases Type LG (nH) LS (nH) LD (nH)
the gate voltage, delays the turn-off time
TO220 3.6 3.9 2.3
and causes ringing and false turn-on
DFN 2.4 0.9 1.3
p This negative feedback brings longer
voltage-current overlap and increases
switching loss
Xiucheng Huang, Tao Liu, Bin Li, Fred C. Lee, and Qiang Li Evaluation and
Applications of 600V/650V Enhancement-Mode GaN Devices , 2015 WiPDA
Ø CSI affects di/dt, not dv/dt Ø For turn-off, there is no voltage transition delay,
since voltage rises before current falls
Ø For turn-on, a lower di/dt can be observed for
TO220 with CSI and no kelvin pin (due to Ig↓) Ø di/dt rate is not much different, since most of
the current transition we observed are for Coss
Ø Voltage transition is postponed due to charging
increased current transition time
Ø However, a severe ringing occurred in TO220
Ø Higher Eon loss for TO220 that may indicate a false turn-on. Eoff loss is
higher for TO220
Xiucheng Huang, Tao Liu, Bin Li, Fred C. Lee, and Qiang Li; Evaluation and Applications of 600V/650V Enhancement-Mode GaN Devices, 2015 WiPDA
Pull-up / Pull-
Configur Sink / VDD Supply Propagation
GaN Drivers Vendor Gate Drive Voltage down
ation Source Voltage Delay
Resistance
Single- 7.6A /
LM5114 TI 4~12.6V ~VDD 2Ω /0.23Ω 12ns
Sided 1.3A
Single-
UCC27611 TI 4A /6A 4~18V 5V 1Ω /0.35Ω 14ns
Sided
Single-
UCC27517 TI 4A/4A 4.5~18V ~VDD 5Ω /0.5Ω 13ns
Sided
Maxim Single-
MAX5048C 7A /3A 4~14V ~VDD 0.84Ω /0.3Ω 8ns
Integrated Sided
Fairchild / Single- 9.7A
FAN3122 4.5V to 18V ~VDD NA 20ns
ON-Semi Sided /7.1A
Single-
Si8271 Silicon Lab 4A /4A 4.2V to 30V ~VDD 2.7Ω /1Ω 60ns (max)
Sided
Half-
Si8273 Silicon Lab 4A /4A 4.2V to 30V ~VDD 2.7Ω /1Ω 60ns (max)
bridge
Half-
NCP51820 ON 2A/1A 9V to 17V 5.5V N/A 25ns
Bridge
1, Capacitive Isolation: The Future AC/DC Power Conversion, Monolithic Power Systems
2, https://www.silabs.com/documents/public/data-sheets/Si827x.pdf
3, TI: Digital Isolators
*Source: GN001 Application Guide: Design with GaN Enhancement mode HEMT, GaN Systems
Ref: Turn-on performance comparison of current-source vs. voltage-source gate drivers, Infineon, APEC 2018
Ø Conduction Loss:
PCond=ID2・Rdson ・ D (D: Duty Cycle)
GaN Power Loss Chart
Ø Switching Loss:
PSwitching=1/2 ・ ID ・ VD ・ (ton+toff )・ fsw
Ø Power Loss from Coss Conduction Loss Switching Loss Gate Driving Loss
PCOSS=EOSS ・ fsw
Wei Zhang, Mastering the art and fundamentals of high voltage gate driver; TI High Volt Interactive
SJ MOSFET with Qrr from body- GaN HEMT with Qoss from other GaN
diode and Qoss
Peter Di Maso, Lucas Lu, GaN E-HEMTs Enable Innovation in Power Switching Applications, GaN Systems, APEC 2017
Ø With same Rdson and same frequency, GaN power loss vs. Si:
IDD VDD quiescent IN=INB=0 Tj=25°C 0.01 mA PARAMETER TEST CONDITION (VDD=5V) MIN TYP UNIT
MAX
current
tR Rise time CL=1nf 5 ns
N-CHANNEL OUTPUT tF Fall time CL=1nf 3 ns
Ron-N (Driver output resistance- VDD = 5V, IN-OUT = –100mA 0.25 tD-ON turn-on propagation Tj=25°C 17
pulling down) delay CL=1nf (TJ) range ns
of 40°C to 12.9
IPK-N peak sink current CL = 10,000 pF 5 A 20
P-CHANNEL OUTPUT 125°C
tD-OFF turn-off propagation Tj=25°C 15.7
Ron-P (Driver output resistance- VDD = 5 V, IN-OUT = 50 mA 2.1 delay CL=1nf (TJ) range ns
pulling up) 13.5
of 40°C to
IPK-P peak source current CL = 10,000 pF 1.3 A 18
125°C
Jingshu Yu, Weijia Zhang, Andrew Shorten, Rophina Li and Wai Tung Ng, A Smart Gate Driver IC for GaN Power Transistors; ISPSD 2018
DRAIN
Sensing Rout
HOLD Stack DYN_OFF small
+ =
Jingshu Yu, Weijia Zhang, Andrew Shorten, Rophina Li and Wai Tung Ng, A Smart Gate Driver IC for GaN Power Transistors; ISPSD 2018
Source: W.J. Zhang, Y.H. Leng, J.S. Yu, Y.S. Lu, C.Y. Cheng and W.T. Ng, A Gate Driver IC for
Enhancement Mode GaN Power Transistors with Precise Dead-time Correction, ISPSD 2019
Ø The SenseFET from GaNPower is rated at 100V/20mΩ with two extra leads for the sensing gate and sensing source
Ø The current of the sensing source is designed to have a small match ratio while providing accurate sensing.
However, the novelty is to use the SenseFET in a voltage clamping circuit to detect reverse conduction of the e-
mode GaN low side output device while protecting the detection circuit from the high voltage swing at the
switching node
Ø The duration of this reverse conduction is then corrected by adjusting the dead-time in the following switching
cycle to ensure optimum power conversion efficiency
Source: W.J. Zhang, Y.H. Leng, J.S. Yu, Y.S. Lu, C.Y. Cheng and W.T. Ng, A Gate Driver IC for
Enhancement Mode GaN Power Transistors with Precise Dead-time Correction, ISPSD 2019
Direct-drive looks like a cascode method, in The voltage slew rate can exceed
which a low voltage MOS is in series with high 100V/ns
voltage D-mode GaN. The difference is that TI
integrates the driver IC to drive the GaN directly,
while the low voltage MOS is used to make the
package normally-off
ü This roughly equals to the silicon lateral BCD technology used 20 years ago
ü Instead, GaN IC is either using Direct-Coupled FET Logic (DCFL) with both E-mode
and D-mode devices, or just use D-mode devices in the IC design
ü Resistors, capacitors are available in GaN IC, much like 20 years ago in silicon BCD
technology
Panasonic GaN IC
• GaN-based Semiconductor Devices for Future Power Switching Systems; Hidetoshi Ishida, Ryo Kajitani,
Yusuke Kinoshita, Hidekazu Umeda, Shinji Ujita, Masahiro Ogawa, Kenichiro Tanaka, Tatsuo Morita,
Satoshi Tamura, Masahiro Ishida and Tetsuzo Ueda; IEDM 2016
• Navitas APEC 2019 Industry paper
ü Both active devices, such as high voltage and low voltage D-mode
and E-mode HEMT are available
Source: Kevin J. Chen, Oliver Häberlen, Alex Lidow, Chun lin Tsai, Tetsuzo Ueda, Yasuhiro Uemoto and Yifeng Wu, GaN-on-Si
Power Technology:, Devices and Applications IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 64, NO. 3, MARCH 2017
Ø One of the first published monolithically integrated GaN IC design with two
generations using directly-coupled FET Logic that combines both D-mode and E-
mode transistors
Source: Gaofei Tang1, M.-H. Kwan2, Zhaofu Zhang1, Jiabei He1, Jiacheng Lei1, R.-Y. Su2, F.-W. Yao2, Y.-M. Lin2, J.-L. Yu2, Thomas Yang2, Chan-
Hong Chern2, Tom Tsai2, H. C. Tuan2, Alexander Kalnitsky2, and Kevin J. Chen1, High-Speed, High-Reliability GaN Power Device with Integrated
Gate Driver; Proceedings of the 30th International Symposium on Power Semiconductor Devices & ICs May 13-17, 2018, Chicago, USA
GaN integrated ESD protection circuit (<2% area) An over-voltage-protection (OVP) function
integrated to the gate of the power device on offered by GaNPower provides gate voltage
the GaN power device platform. Human body protection by clamping gate voltage below
model ESD voltage on the gate can exceed 5 kV required maximum gate voltage of GaN when
from −45 °C to 150 °C the driver output exceed the maximum
Source: Kevin J. Chen, Oliver Häberlen, Alex Lidow, Chun lin Tsai, Tetsuzo Ueda, Yasuhiro Uemoto and Yifeng Wu, GaN-on-Si
Power Technology:, Devices and Applications IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 64, NO. 3, MARCH 2017
Need more detailed analysis from the application side to fully compare the
benefits and drawbacks of using either monolithically integrated GaN solution
or Si driver + GaN solution
Source: Kevin J. Chen, Oliver Häberlen, Alex Lidow, Chun lin Tsai, Tetsuzo Ueda, Yasuhiro Uemoto and Yifeng Wu, GaN-on-Si
Power Technology:, Devices and Applications IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 64, NO. 3, MARCH 2017
IMEC is offering GaN IC for MPW (multi-project-wafer) based on their GaN-on-SOI epitaxy.
They have also demonstrated first high-side/low-side GaN-IC on chip with perfect isolation
Source: https://www.imec-int.com/en/200mm-GaN-on-Si-technology
(From Yole Development with modifications). Gate Drivers market evolution: coreless isolation and WBG specific solutions,
Yole Development, APEC 2018
Over
EMI
Temperature
Suppression
Smart Gate Protection
Switching
Power Loss
Driver Over/Under
Voltage
Control Protection
Parallel
Current Self Diagnosis
Ballancing Current Sensing/ Temperature
Regulation Sensing
Ref: Design Trends in Smart Gate Driver ICs for Power MOSFETs and IGBTs, ASICON 2017
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